F. Houlihan

发表

CHEMICAL AMPLIFICATION IN THE DESIGN OF POLYMERS FOR RESIST APPLICATIONS.

C. Willson, Hiroshi Ito, J. Fréchet, 1982 .

Thermally depolymerizable polycarbonates. 2. Synthesis of novel linear tertiary copolycarbonates by phase-transfer catalysis

Jean M. J. Fréchet, Francis M. Houlihan, Carlton G Willson, 1986 .

Approaches to the Design of Radiation‐Sensitive Polymeric Imaging Systems with Improved Sensitivity and Resolution

C. Willson, Hiroshi Ito, J. Fréchet, 1986 .

Thermally Depolymerizable Polycarbonates V. Acid Catalyzed Thermolysis of Allylic and Benzylic Polycarbonates: A New Route to Resist Imaging

C. Willson, F. Houlihan, J. Fréchet, 1987 .

Chemically amplified resists: Chemistry and processes

F. Houlihan, O. Nalamasu, E. Reichmanis, 1994 .

Poly(t‐BOC‐styrene sulfone)‐based chemically amplified resists for deep‐UV lithography

F. Houlihan, E. Reichmanis, L. F. Thompson, 1989 .

193 nm Immersion Lithography-Taking the Plunge

Andrew R. Romano, F. Houlihan, R. Dammel, 2004 .

Chemical amplification mechanisms for microlithography

Elsa Reichmanis, Omkaram Nalamasu, F. M. Houlihan, 1991 .

Polymers, Photoresponsive (in Electronic Applications)

F. Houlihan, O. Nalamasu, E. Reichmanis, 2003 .

Resist design concepts for 193 nm lithography: Opportunities for innovation and invention

F. Houlihan, O. Nalamasu, E. Reichmanis, 1997 .

Materials Challenges and Alternatives for Advanced Photolithographic Patterning: From 193 to 157 nm and Beyond

F. Houlihan, O. Nalamasu, E. Reichmanis, 2000 .

Lithographic Materials Technologies: 193 nm Imaging and Beyond

Allen H. Gabor, M. J. Bowden, F. Houlihan, 1999 .

Evaluation of novel fluorinated resist matrices for 157-nm lithography

Will Conley, Ralph R. Dammel, Andrew R. Romano, 2003, SPIE Advanced Lithography.

Surface roughness investigation of 157- and 193-nm polymer platforms using different etch conditions

Andrew R. Romano, F. Houlihan, C. Hohle, 2005 .

Photogenerators of Sulfamic Acids; Use in Chemically Amplified Single Layer Resists

Allen H. Gabor, F. Houlihan, J. Biafore, 1998 .

Phase transfer catalysis in the tert-butyloxycarbonylation of alcohols, phenols, enols, and thiols with di-tert-butyl dicarbonate

Jean M. J. Fréchet, Francis M. Houlihan, Carlton G Willson, 1985 .

193 nm single layer resist strategies, concepts, and recent results

Allen H. Gabor, F. Houlihan, O. Nalamasu, 1998 .

Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography

F. Houlihan, O. Nalamasu, E. Reichmanis, 1999 .

Synthesis and characterization of the tert-butyl ester of the oxydianiline/pyromellitic dianhydride polyamic acid

F. Houlihan, C. Pryde, C. W. Wilkins, 1989 .

Organic Materials Challenges for 193 nm Imaging

F. Houlihan, O. Nalamasu, E. Reichmanis, 1999 .

Low-cost, low-loss microlens arrays fabricated by soft-lithography replication process

John A. Rogers, F. M. Houlihan, J. A. Liddle, 2003 .

Microlens arrays for optoelectronic devices

J. Rogers, F. Houlihan, O. Nalamasu, 2002 .

Design, synthesis, characterization, and use of all-organic, nonionic photogenerators of acid

Elsa Reichmanis, Janet M. Kometani, F. M. Houlihan, 1991 .

Fundamental studies of dissolution inhibition in poly(norbornene-alt-maleic anhydride) based resins

F. Houlihan, O. Nalamasu, E. Reichmanis, 2001 .

Solid-state NMR characterization of resist formulations for 193-nm lithography: chain dynamics and length scale of mixing

Francis M. Houlihan, Ilya L. Rushkin, Peter A. Mirau, 2000, Advanced Lithography.

New Fluorinated Resins for 157 nm Lithography Application

Andrew R. Romano, Georgia K. Rich, J. McDaniels, 2003 .

Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrixes: studies pertaining to chemical amplification and imaging

Elsa Reichmanis, Janet M. Kometani, Larry F. Thompson, 1990 .

Chemically Amplified Resists: The Chemistry and Lithographic Characteristics of Nitrobenzyl Benzenesulfonate Derivatives.

F. Houlihan, O. Nalamasu, J. M. Kometani, 1990 .

Nitrobenzyl ester chemistry for polymer processes involving chemical amplification

Elsa Reichmanis, A. Shugard, F. M. Houlihan, 1988 .

Novel derivatives of poly(4-hydroxystyrene) with easily removable tertiary, allylic, or benzylic ethers

C. Willson, J. Fréchet, F. Houlihan, 1988 .

Chemical Amplification Mechanisms for Microlithography

Elsa Reichmanis, Omkaram Nalamasu, F. M. Houlihan, 1991 .

Photoinduced Doping and Photolithography of Methyl-Substituted Polyaniline

G. Johnson, X. Quan, F. Houlihan, 1995 .

Synthesis of Cycloolefin−Maleic Anhydride Alternating Copolymers for 193 nm Imaging

Elsa Reichmanis, Omkaram Nalamasu, F. M. Houlihan, 1997 .

Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography

Thomas I. Wallow, Elsa Reichmanis, Omkaram Nalamasu, 1996, Advanced Lithography.

Resist component leaching in 193-nm immersion lithography

Ralph R. Dammel, Woo-Kyu Kim, Andrew R. Romano, 2005, SPIE Advanced Lithography.

Responding to the Challenge: Materials Design for Immersion Lithography

Andrew R. Romano, Karen L. Turnquest, Georgia K. Rich, 2006 .

Photogenerated Acid-Catalyzed Formation of Phosphonic/Phosphoric Acids by Deprotection of Esters in Polymer Films

F. Houlihan, O. Nalamasu, J. M. Kometani, 1995 .

Revolutionary and evolutionary resist design concepts for 193 nm lithography

O. Wood, F. Houlihan, O. Nalamasu, 1997 .

Design and synthesis of novel allylic and benzylic copolycarbonates susceptible to acidolytic or thermolytic depolymerization

C. Grant Willson, Jean M. J. Fréchet, Francis M. Houlihan, 1986 .