S. W. Butler

Development of Techniques for Real‐Time Monitoring and Control in Plasma Etching I . Response Surface Modeling of and Etching of Silicon and Silicon Dioxide

K. J. McLaughlin, T. Edgar, S. W. Butler, 1991 .

Modeling and control of microelectronics materials processing

Thomas F. Edgar, Isaac Trachtenberg, Thomas A. Badgwell, 1995 .

Development of Techniques for Real‐Time Monitoring and Control in Plasma Etching II . Multivariable Control System Analysis of Manipulated, Measured, and Performance Variables

Thomas F. Edgar, Isaac Trachtenberg, K. J. McLaughlin, 1991 .