M. Kocsis

Characterizing and modeling electrical response to light for metal-based EUV photoresists

Geert Vandenberghe, John J. Biafore, Danilo De Simone, 2016, SPIE Advanced Lithography.

Metal oxide EUV photoresist performance for N7 relevant patterns and processes

Geert Vandenberghe, Peter De Schepper, Danilo De Simone, 2016, SPIE Advanced Lithography.

Advanced development methods for high-NA EUV lithography

M. Somervell, K. Nafus, S. Nagahara, 2023, Advanced Lithography.

Directly patterned inorganic hardmask for EUV lithography

Patrick P. Naulleau, Douglas A. Keszler, Christopher N. Anderson, 2011, Advanced Lithography.