V. Rutigliani

Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization

Gian Francesco Lorusso, Gijsbert Rispens, Vito Rutigliani, 2018, Advanced Lithography.

Unbiased roughness measurements: Subtracting out SEM effects

C. Mack, G. Lorusso, V. Rutigliani, 2018 .

Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

Liping Zhang, V. Rutigliani, S. Porter, 2015 .

Optimized pore stuffing for enhanced compatibility with interconnect integration flow

K. Croes, O. Pedreira, Z. Tokei, 2015, 2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM).

Line edge roughness metrology: recent challenges and advances toward more complete and accurate measurements

Evangelos Gogolides, Vassilios Constantoudis, Gian F. Lorusso, 2018, Journal of Micro/Nanolithography, MEMS, and MOEMS.

Computational nanometrology of line-edge roughness: noise effects, cross-line correlations and the role of etch transfer

Vito Rutigliani, Frieda Van Roey, Evangelos Gogolides, 2018, Advanced Lithography.

Multifractal analysis of line-edge roughness

Vito Rutigliani, Evangelos Gogolides, Frieda van Roey, 2018, Advanced Lithography.

Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist

Gian Francesco Lorusso, Vito Rutigliani, Vassilios Constantoudis, 2017, Advanced Lithography.