V. Philipsen

发表

Pattern fidelity verification for logic design in EUV lithography

Germain Fenger, Vicky Philipsen, Eric Hendrickx, 2014, Advanced Lithography.

Analysis method to determine and characterize the mask mean-to-target and uniformity specification

Jeroen Van de Kerkhove, Han-Ku Cho, Joo-Tae Moon, 2006, European Mask and Lithography Conference.

Ni-Al Alloys as Alternative EUV Mask Absorber

Vicky Philipsen, Eric Hendrickx, Marc Heyns, 2018 .

Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

K. Opsomer, C. Detavernier, F. Scholze, 2021 .

Determination of optical constants of thin films in the EUV.

K. Opsomer, C. Detavernier, F. Scholze, 2022, Applied optics.

Double-resonant photoionization spectroscopy of SrI

V. Philipsen, R. Silverans, H. Telle, 2000 .

High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments

R. Ciesielski, V. Philipsen, S. Brose, 2022, European Mask and Lithography Conference.

Sputtering of metals: Probing and modelling the emission of atoms in different electronic states

V. Philipsen, R. Silverans, P. Lievens, 2001 .

The detection of Sr sputtered from metallic and biological matrices by double-resonant photoionization mass spectrometry

V. Philipsen, R. Silverans, H. Telle, 2002 .

Mask absorber development to enable next-generation EUVL

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2019, Photomask Japan.

Time-frequency analysis assisted reconstruction of ruthenium optical constants in the sub-EUV spectral range 8 nm – 75 nm

Jena, Belgium, H Germany, 2021, Optics Express.

Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask

V. Philipsen, R. Kim, D. Rio, 2022, Journal of Micro/Nanopatterning, Materials, and Metrology.

Investigation of low-n mask in 0.33 NA EUV single patterning at pitch 28nm metal design

V. Philipsen, R. Kim, Dongbo Xu, 2022, Advanced Lithography.

EUV low-n attenuated phase-shift mask on random logic via single patterning at pitch 36nm

Jae Uk Lee, J. van de Kerkhove, V. Philipsen, 2022, Advanced Lithography.

Attenuated PSM for EUV: Can they mitigate 3D mask effects?

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2018, Advanced Lithography.

On the Optical Constants of Cobalt in the M-Absorption Edge Region

F. Scholze, V. Philipsen, C. Laubis, 2022, Optik.

Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

F. Scholze, V. Philipsen, A. Erdmann, 2022, Photomask Technology.

Sputtering of Ag atoms into metastable excited states

Vicky Philipsen, Peter Lievens, Jeroen Bastiaansen, 2002 .

Measurements of the population partitions and state-selected flight-time distributions of keV ion-beam-sputtered metastable atoms

V. Philipsen, R. Silverans, P. Lievens, 2001 .

Sputtering of atoms in fine structure states: a probe of excitation and de-excitation events

V. Philipsen, B. Garrison, R. Silverans, 1998 .

Emission of ground and metastable state Ni and Co atoms during ion-beam sputtering: Quantitative measurements of population and kinetic energy distributions

V. Philipsen, R. Silverans, P. Lievens, 1998 .

Anomalous Sputtering Behavior Observed by Quantitative Measurements of the Population Partition of Metastable Ni Atoms

V. Philipsen, R. Silverans, P. Lievens, 1997 .

Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Linard Karklin, Vicky Philipsen, Rik M. Jonckheere, 2002, SPIE Advanced Lithography.

Two-step resonant photoionization spectroscopy of Co I and Ni I: continuum structure near the first ionization limit

V. Philipsen, R. Silverans, P. Lievens, 1999 .

Resonant electron transfer during ion-beam sputtering of metals studied by double-resonant laser ionization

V. Philipsen, R. Silverans, P. Lievens, 2000 .

Resonant electron transfer in the emission of ion-beam sputtered metal atoms studied by double resonance laser ionization

V. Philipsen, R. Silverans, P. Lievens, 2000 .

Even-parity auto-ionizing states of iridium I observed by resonance laser ionization spectroscopy

V. Philipsen, R. Silverans, P. Lievens, 2002 .

Two-color two-step laser ionization spectroscopy of uranium sputtered from thin metallic films

V. Philipsen, R. Silverans, M. Betti, 2001 .

Velocity dependent electron transfer during emission of ion-beam sputtered Cu atoms

V. Philipsen, R. Silverans, P. Lievens, 2003 .

Mask transmission resonance in bi-layer masks

Peter De Bisschop, Vicky Philipsen, Kei Mesuda, 2008, Photomask Japan.

Observation of negative mask error enhancement factor due to mask transmission resonance

V. Philipsen, P. Bisschop, Kei Mesuda, 2008 .

Study of novel EUVL mask absorber candidates

Patrick Jaenen, Vicky Philipsen, Victor Soltwisch, 2021 .

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

Vicky Philipsen, Eric Hendrickx, Andreas Erdmann, 2017 .

Mask-induced polarization effects at high NA

Bruce W. Smith, Philippe Foubert, Anatoly Bourov, 2005, SPIE Advanced Lithography.

Hyper-NA EUV lithography: an imaging perspective

E. Hendrickx, V. Philipsen, S. De Gendt, 2023, Advanced Lithography.