A. Fuchs

发表

Achieving optimum diffraction based overlay performance

Peter Vanoppen, David Laidler, Mariya Ponomarenko, 2010, Advanced Lithography.

Wafer scale patterning by soft UV-nanoimprint lithography

H. Kurz, T. Glinsner, A. Fuchs, 2004 .

Interferometric in situ alignment for UV-based nanoimprint

Heinrich Kurz, A. Fuchs, Thorsten Wahlbrink, 2004 .

Fabrication of 12 nm electrically variable shallow junction metal–oxide–semiconductor field effect transistors on silicon on insulator substrates

H. Kurz, A. Fuchs, Y. Georgiev, 2003 .

Surface roughness of hydrogen silsesquioxane as a negative tone electron beam resist

Heinrich Kurz, A. Fuchs, W. Henschel, 2005 .

Large scale ultraviolet-based nanoimprint lithography

Max C. Lemme, Heinrich Kurz, A. Fuchs, 2003 .

High resolution lithography with PDMS molds

Thomas Glinsner, Heinrich Kurz, A. Fuchs, 2004 .

Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material

Heinrich Kurz, Jens Bolten, A. Fuchs, 2007 .

Status and prospects of UV-Nanoimprint technology

A. Fuchs, U. Plachetka, H. Kurz, 2006 .

3D structures for UV-NIL template fabrication with grayscale e-beam lithography

A. Fuchs, U. Plachetka, Ulrich Barth, 2007 .

YieldStar: a new metrology platform for advanced lithography control

Kaustuve Bhattacharyya, Michael Kubis, Martin Ebert, 2011, European Mask and Lithography Conference.