Hung-Eil Kim

发表

Novel hardening methods of DUV chemically amplified photoresist by ion implantation and its application to new organic ARC material and bilayer process

Jun-Sung Chun, Hung-Eil Kim, Stanley Barnett, 1999, Advanced Lithography.

Effect of mask critical dimension error for subquarter-micron contact hole

Jun-Sung Chun, Hung-Eil Kim, Stanley Barnett, 1999, Advanced Lithography.

Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technology

Soo-Han Choi, Young-Mog Ham, Hung-Eil Kim, 1994, Advanced Lithography.

Effect of pattern density for contact windows in an attenuated phase shift mask

Ki-Ho Baik, Chang-Nam Ahn, Il-Ho Lee, 1995, Advanced Lithography.

Optimization of stepper parameters and its design rule for an attenuated phase-shifting mask

Hung-Eil Kim, Stanley Barnett, James Shih, 1998, Advanced Lithography.

Quarter-micrometer i-line lithography using an alternating phase-shift mask

Soo-Han Choi, Young-Mog Ham, Young Sik Kim, 1994, Advanced Lithography.

Implementation of i-line lithography to 0.30 um design rules

Jin-Soo Kim, Ki-Ho Baik, Seung-Chan Moon, 1995, Advanced Lithography.

Challenges for the quality control of assist features for 45nm node technology and beyond

Makoto Takahashi, Todd Lukanc, Lin Wang, 2008, Photomask Technology.

Practical implementation of alternating PSM to memory device of sub-0.25-um technology

Ki-Ho Baik, Chang-Nam Ahn, Hee-Bom Kim, 1996, Advanced Lithography.

Application of alternating PSM to sub-quarter-micrometer technology using i-line lithography

Chang-Nam Ahn, Hung-Eil Kim, KeunYoung Kim, 1995, Photomask Technology.