R. Howell

EUV source-mask optimization for 7nm node and beyond

Paul van Adrichem, Thijs Hollink, Stephen Hsu, 2014, Advanced Lithography.

Freeform mask optimization using advanced image based M3D inverse lithography and 3D-NAND full chip OPC application

Gang Xu, Stephen Hsu, Jun He, 2018, Advanced Lithography.

Efficient full-chip SRAF placement using machine learning for best accuracy and improved consistency

Quan Zhang, Yu Cao, Yen-Wen Lu, 2018, Advanced Lithography.

Accurate characterization of 2D etch bias by capturing surrounding effects from resist and trench areas

Mu Feng, Keith Gronlund, Yongfa Fan, 2017, Advanced Lithography.

Mathematical Foundations of a Geometric Theory of Diffraction for Light Scattering from a 3D Topographic Photomask

Yu Cao, R. Howell, David H. Wei, 2019, 2019 PhotonIcs & Electromagnetics Research Symposium - Spring (PIERS-Spring).