Hua‐yu Liu

EUV source-mask optimization for 7nm node and beyond

Paul van Adrichem, Thijs Hollink, Stephen Hsu, 2014, Advanced Lithography.

Characterization of a high‐resolution novolak based negative electron‐beam resist with 4 μC/cm2 sensitivity

Hua‐yu Liu, Mark P. deGrandpre, W. Feely, 1988 .

Separable OPC models for computational lithography

Lieve Van Look, Geert Vandenberghe, Jo Finders, 2008, Photomask Japan.

Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Linard Karklin, Vicky Philipsen, Rik M. Jonckheere, 2002, SPIE Advanced Lithography.

Microsecond pulsed yellow emission by intracavity doubled optically pumped two-chip VECSEL

D. Cui, Q. Bian, Q. Peng, 2023, Laser Physics Letters.

Fast and accurate 3D mask model for full-chip OPC and verification

Yu Cao, Jiong Jiang, Peng Liu, 2007, SPIE Advanced Lithography.

A full-chip 3D computational lithography framework

Yen-Wen Lu, Qian Zhao, Mu Feng, 2012, Advanced Lithography.