D. Tichenor

发表

Diffraction-limited soft-x-ray projection imaging using a laser plasma source.

R. H. Stulen, D. Tennant, J. Bokor, 1991, Optics letters.

Computer Analysis Of Holographic Interferograms For Nondestructive Testing

Daniel A. Tichenor, V. P. Madsen, D. Tichenor, 1979 .

Particle size measurements using an optical variable-frequency-grid technique.

D. Tichenor, J. Wang, 1981, Applied optics.

Coherent Transfer Function

Joseph W. Goodman, Daniel A. Tichenor, J. Goodman, 1972 .

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Kenneth A. Goldberg, Regina Soufli, Patrick P. Naulleau, 2002 .

Optically determined temperatures, sizes, and velocities of individual carbon particles under typical combustion conditions

K. R. Hencken, D. Tichenor, S. Niksa, 1985 .

Simultaneous in situ measurement of the size, temperature and velocity of particles in a combustion environment

K. R. Hencken, D. Tichenor, S. Niksa, 1985 .

Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2002, SPIE Advanced Lithography.

Initial results from the EUV engineering test stand

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2001, SPIE Optics + Photonics.

Recent advances in the Sandia EUV 10x microstepper

Richard H. Stulen, Avijit K. Ray-Chaudhuri, Rodney P. Nissen, 1998, Advanced Lithography.

Volume, index‐of‐refraction, and stress changes in electron‐irradiated vitreous silica

T. A. Dellin, D. A. Tichenor, D. Tichenor, 1977 .

Mass-producible microtags for security applications: Tolerance analysis by rigorous coupled-wave analysis

Richard H. Stulen, Avijit K. Ray-Chaudhuri, Kevin D. Krenz, 1997, Photonics West.

First lithographic results from the extreme ultraviolet Engineering Test Stand

Richard H. Stulen, Donald W. Sweeney, Kenneth A. Goldberg, 2001 .

Design criteria and recent developments of optical single particle counters for fossil fuel systems

Daniel A. Tichenor, James C. F. Wang, D. R. Hardesty, 1981 .

Characterization of AZ PN114 resist for soft-x-ray projection lithography.

D. Tennant, A. MacDowell, D. Tichenor, 1993, Applied optics.

Recent results in the development of an integrated EUVL laboratory tool

Richard H. Stulen, R. W. Arling, John E. Bjorkholm, 1995, Advanced Lithography.

Surface characterization of optics for EUV lithography

Donald W. Sweeney, Sherry L. Baker, D. P. Gaines, 1996, Extreme Ultraviolet Lithography (TOPS).

Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool

Richard H. Stulen, Obert R. Wood, R. W. Arling, 1996, Advanced Lithography.

Resist performance in soft x-ray projection lithography

Weng W. Chow, William C. Sweatt, Daniel A. Tichenor, 1993, Advanced Lithography.