J. Flicstein

发表

A refractometric method for continuous investigation of stirred crystal growth organic solutions

M. Sigelle, J. Flicstein, R. Hierle, 1983 .

Very high-resolution focused ion beam nanolithography improvement: A new three-dimensional patterning capability

J. Giérak, D. Mailly, J. Flicstein, 1999 .

SPONTANEOUS LOW FREQUENCY OSCILLATION STUDIES IN GALLIUM ARSENIDE FAST PHOTOCONDUCTORS

J. Flicstein, P. Bergonzo, P. Petit, 1999 .

Improvement of silicon oxide film properties by ultraviolet excimer lamp annealing

J. Flicstein, M. Pérez-Amor, R. Devine, 1995 .

A Monte Carlo simulation of silicon nitride thin film microstructure in ultraviolet localized-chemical vapor deposition

J. Flicstein, J. Palmier, J. Courant, 1998 .

Tunable UV-flash krypton lamp array useful for large area deposition and in situ UV annealing of Si-based dielectrics

C. Licoppe, J. Flicstein, C. Debauche, 1995 .

SURFACE MECHANISMS IN THE UVCVD OF SiO2 FILMS

E. Petit, C. Licoppe, J. Flicstein, 1991 .

Modeling and dynamic simulation of ultraviolet induced growing interfaces

J. Flicstein, C. Daguet, J. Palmier, 1999 .

Effect of crucible size in flux crystallization of DyAlO3or Dy3Al5O12

M. Schieber, J. Flicstein, 1973 .

Inhibition of the Fe3+H2O2 reaction by acetone

J. Flicstein, M. L. Kremer, 1967 .

Metal photodeposition and light-induced nucleation

J. Flicstein, J. Bourée, 1989 .

UV Light-Assisted Deposition of Al on Si from TMA

J. Flicstein, J. Bourée, 1988 .

Cellular growth in BaFe12O19 crystals solidified from flux solvent

M. Schieber, J. Flicstein, J. Aidelberg, 1974 .

Nucleation and deposition of W on GaAs by excimer laser‐assisted chemical vapor deposition

J. Flicstein, W. Sinke, A. V. Maaren, 1993 .

Evidence for a transitory composition pattern in the early stages of the photochemical deposition of silica films on semiconductors

Christian Licoppe, Yves Nissim, J. Flicstein, 1991 .

A combination of rapid thermal processing and photochemical deposition for the growth of SiO2 suitable for InP device applications

J. Flicstein, Y. I. Nissim, C. Licoppe, 1990 .

UV annealing of low temperature photodeposited SiO2 films with a new powerful lamp source

J. Flicstein, C. Licoppe, J. Flicstein, 1992 .

Kinetics of growth and segregation of impurities of vanadium, gallium, zinc and magnesium in hydrothermally grown quartz☆

M. Schieber, J. Flicstein, 1971 .

Photonucleation and Photodeposition of A1 on Si from Flowing

J. Flicstein, J. E. Bourree, 1989 .

Al Photodeposition and Light-Induced Nucleation on p-Type Si from TMA

J. Flicstein, J. Bourée, J. Bresse, 1988 .

Limiting Steps at Low Temperature in Direct Writing of Al on Si From Tma

J. Flicstein, J. Bourée, J. Bresse, 1987 .

Room Temperature Uv Laser Continuous Direct Writing of Al From Tma

J. Flicstein, J. Bourée, 1987 .

Direct Writing of Al on Si by UV Exposure Prior to Laser-Assisted CVD

J. Flicstein, J. Bourée, Y. Nissim, 1986 .

Process for the photochemical treatment of a material using a source of light tubes has eclairs.

C. Licoppe, J. Flicstein, Y. Vitel, 1991 .

Microsegregation of impurities in hydrothermally-grown quartz crystals

M. Schieber, J. Flicstein, 1974 .

Direct writing of gold nanostructures using a gold-cluster compound and a focused ion beam

J. Giérak, H. Bergh, J. Flicstein, 1993 .

Nano-fabrication with focused ion beams

Dominique Mailly, Claude Chappert, Jean-Luc Pelouard, 2001 .

Direct writing of iridium lines with a focused ion beam

J. Giérak, H. Bergh, J. Flicstein, 1991 .

Analysis and Visualization of Computer Simulations of Amorphous Photo-Deposition

M. Sigelle, J. Flicstein, J. Márquez, 2007 .

Gold nanograins deposited from a liquid metal ion source

J. Giérak, C. Vieu, J. Flicstein, 1997 .

A comparison of SiO2 thin-film UVCVD rates and mechanisms from SiH4/O2 and SiH4/N2O precursor gases by surface-sensitive infrared spectroscopy

C. Licoppe, J. Flicstein, C. Debauche, 1993 .

Differences in the SiO2/InP interfaces obtained by thermal and UV-induced chemical vapour deposition

J. Flicstein, Y. I. Nissim, J. M. Moison, 1992 .

Atomistic comparative study of VUV photodeposited silicon nitride on InP(100) by simulation and atomic force microscopy

J. Flicstein, J. Palmier, C. David, 2000 .