S. Minegishi

发表

Reactive ion etching challenges for half-pitch sub-10-nm line-and-space pattern fabrication using directed self-assembly lithography

Hitoshi Kubota, Katsuyoshi Kodera, Tsukasa Azuma, 2016, SPIE Advanced Lithography.

Electrical yield verification of half-pitch 15 nm patterns using directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2015 .

Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

Yuriko Seino, Hironobu Sato, N. Kihara, 2015 .

Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2016 .

A Simulation Study on Defectivity in Directed Self-assembly Lithography

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2015 .

Recent Progress in EUV Resist Outgas Research at EIDEC

Takeo Watanabe, H. Kinoshita, S. Minegishi, 2015 .

Simulation study on defect annihilation dynamics in directed self-assembly lithography

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2015 .

How constant are Ritchie's constant selectivity relationships? a general reactivity scale for n-, π-, and σ-nucleophiles

Shinya Minegishi, Herbert Mayr, S. Minegishi, 2003 .

Solvent nucleophilicity.

S. Minegishi, H. Mayr, Shinjiro Kobayashi, 2004, Journal of the American Chemical Society.

Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing.

Hironobu Sato, N. Kihara, S. Minegishi, 2017, ACS applied materials & interfaces.

Sub-10-nm patterning process using directed self-assembly with high χ block copolymers

Katsuyoshi Kodera, Tomoharu Fujiwara, Tsukasa Azuma, 2015 .

A Challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

Y. Kasahara, Hironobu Sato, H. Kubota, 2015 .

Precise Synthesis of Fluorine-containing Block Copolymers via RAFT

Y. Kasahara, Hironobu Sato, N. Kihara, 2016 .

Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing.

Hironobu Sato, N. Kihara, S. Minegishi, 2017, ACS applied materials & interfaces.

Process Evaluation of Directed Self-assembly Lithography using Simulation Method based on Self-consistent Field Theory

Y. Kasahara, Hironobu Sato, H. Kanai, 2014 .