Toshikatsu Tobana

Reactive ion etching challenges for half-pitch sub-10-nm line-and-space pattern fabrication using directed self-assembly lithography

Hitoshi Kubota, Katsuyoshi Kodera, Tsukasa Azuma, 2016, SPIE Advanced Lithography.

Electrical yield verification of half-pitch 15 nm patterns using directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2015 .

Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2016 .

A Simulation Study on Defectivity in Directed Self-assembly Lithography

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2015 .

Simulation study on defect annihilation dynamics in directed self-assembly lithography

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2015 .

A Challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

Y. Kasahara, Hironobu Sato, H. Kubota, 2015 .

Driving DSA into volume manufacturing

Seiji Nagahara, Kathleen Nafus, Shinichiro Kawakami, 2015, Advanced Lithography.

Pattern defect reduction and LER improvement of chemo-epitaxy DSA process

Makoto Muramatsu, Takahiro Kitano, Kiyohito Ito, 2017, Advanced Lithography.