M. Shiraishi

Reactive ion etching challenges for half-pitch sub-10-nm line-and-space pattern fabrication using directed self-assembly lithography

Hitoshi Kubota, Katsuyoshi Kodera, Tsukasa Azuma, 2016, SPIE Advanced Lithography.

Electrical yield verification of half-pitch 15 nm patterns using directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2015 .

Characterization of half-pitch 15-nm metal wire circuit fabricated by directed self-assembly of polystyrene-block-poly(methyl methacrylate)

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2016 .

A Simulation Study on Defectivity in Directed Self-assembly Lithography

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2015 .

Low-Stress Molybdenum/Silicon Multilayer Coatings for Extreme Ultraviolet Lithography

M. Shiraishi, W. Ishiyama, K. Murakami, 2000, Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387).

Simulation study on defect annihilation dynamics in directed self-assembly lithography

Y. Kasahara, Yuriko Seino, Hironobu Sato, 2015 .

Optical properties of lead–tin fluoro phosphate glass doped with porphyrin metallocomplexes

M. Shiraishi, H. Inoue, K. Soga, 1999 .

Effect of argon and non-argon ion impingement on the stress reduction of multilayers for extreme-ultraviolet lithography

Katsuhiko Murakami, Tetsuya Oshino, Noriaki Kandaka, 2002, SPIE Advanced Lithography.

Stress control of Mo/Si-based multilayer coatings deposited by ion-beam sputtering

Katsuhiko Murakami, Masayuki Shiraishi, M. Shiraishi, 2001, SPIE Optics + Photonics.

In-situ stress measurement of molybdenum/silicon multilayers and low-stress multilayers for extreme-ultraviolet lithography

Katsuhiko Murakami, Tetsuya Oshino, Noriaki Kandaka, 2001, SPIE Advanced Lithography.

Stress reduction of molybdenum/silicon multilayers deposited by ion-beam sputtering

Katsuhiko Murakami, Tetsuya Oshino, Masayuki Shiraishi, 2000, Advanced Lithography.

A Challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials

Y. Kasahara, Hironobu Sato, H. Kubota, 2015 .

A simple modeling of carbon contamination on EUV exposure tools based on contamination experiments with synchrotron source

T. Yamaguchi, Katsuhiko Murakami, Tetsuya Oshino, 2011, Advanced Lithography.