Scott Alan Anderson

Photomask etch and profile control of 65nm chromeless phase lithography masks using scanning probe metrology

Alex Buxbaum, Scott Alan Anderson, Ajay Kumar, 2005, Photomask Japan.

Optimization of a 65-nm alternating phase-shift quartz etch process

Scott Alan Anderson, Rex B. Anderson, Jason O. Clevenger, 2003, SPIE Photomask Technology.

Integrated phase shift measurements for advanced mask etch process control

George Li, Scott Alan Anderson, Cynthia B. Brooks, 2003, SPIE Photomask Technology.

Examination of various endpoint methods for chrome mask etch

Scott Alan Anderson, Cynthia B. Brooks, Rex B. Anderson, 2003, SPIE Photomask Technology.

Evaluation of quartz dry etching performance for next generation phase-shift mask applications

Ajay Kumar, Renee Koch, Scott Alan Anderson, 2005, SPIE Photomask Technology.

Quartz etch challenges for 45 nm phase-shift masks

Ajay Kumar, Scott Alan Anderson, Ibrahim M. Ibrahim, 2006, Photomask Japan.

Exploring the 65nm frontier of alternating phase shifting masks with a quartz dry etch chemistry

Ajay Kumar, Scott Alan Anderson, Ibrahim M. Ibrahim, 2004, SPIE Advanced Lithography.

Optical emission endpoint optimization in the tetra etch chamber for production of embedded phase-shift photomasks

Scott Alan Anderson, Cynthia B. Brooks, Rex B. Anderson, 2003, European Mask and Lithography Conference.