S. Prins

Multiparameter grating metrology using optical scatterometry

J. McNeil, C. Raymond, M. Murnane, 1997 .

16 MB DRAM trench depth characterization using dome scatterometry

Ziad Hatab, J. McNeil, S. S. Naqvi, 1994 .

Material Loss Impact on Device Performance for 32nm CMOS and Beyond

S. Prins, B. Kirkpatrick, J. J. Chambers, 2009 .

Effect of stress on performance of dense wavelength division multiplexing filters: optical properties.

J. McNeil, S. Prins, W. Herrmann, 2004, Applied optics.

Using scattered-light modeling for semiconductor critical dimension metrology and calibration

Donald R. Hush, Gary A. Peterson, John R. McNeil, 1993, Advanced Lithography.