Luo Guihai

发表

Fe-Nx/C assisted chemical-mechanical polishing for improving the removal rate of sapphire

G. Pan, Li Xu, C. Zou, 2015 .

Chemical mechanical planarization (CMP) of on-axis Si-face SiC wafer using catalyst nanoparticles in slurry

G. Pan, Xiaolei Shi, Luo Guihai, 2014 .

Fabrication of an ordered mesoporous nanoparticle SiO2/Mc and their CMP of fused silica application

G. Pan, Li Xu, C. Zou, 2018 .

XPS, UV-vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)

G. Pan, Li Xu, C. Zou, 2014 .

Achieving ultralow surface roughness and high material removal rate in fused silica via a novel acid SiO2 slurry and its chemical-mechanical polishing mechanism

M. Dargusch, G. Pan, Li Xu, 2020 .

A non-noble material cathode catalyst dual-doped with sulfur and nitrogen as efficient electrocatalysts for oxygen reduction reaction

G. Pan, Li Xu, C. Zou, 2015 .

Influence of colloidal silica dispersion on the decrease of roughness in silicon chemical mechanical polishing

G. Pan, Luo Guihai, Yuhong Liu, 2016 .

Effects of ultra-smooth surface atomic step morphology on chemical mechanical polishing (CMP) performances of sapphire and SiC wafers

G. Pan, Xiaolei Shi, Luo Guihai, 2015 .

Synthesis of dual-doped non-precious metal electrocatalysts and their electrocatalytic activity for oxygen reduction reaction

G. Pan, Li Xu, C. Zou, 2014 .