Jangho Shin

Resist line edge roughness and aerial image contrast

Jangho Shin, G. Han, Yuansheng Ma, 2001 .

Application results of lot-to-lot high-order and per-shot overlay correction for sub-60-nm memory device fabrication

Jung-Hyeon Lee, Jangho Shin, Sangmo Nam, 2009 .

Image analysis of alignment and overlay marks with compound structure

Han-Ku Cho, Joo-Tae Moon, Seong-Sue Kim, 2007, SPIE Advanced Lithography.

Line edge roughness and photoresist percolation development model

Franco Cerrina, Yuansheng Ma, Jangho Shin, 2003 .

Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance

Han-Ku Cho, Joo-Tae Moon, Woo-Sung Han, 2004, SPIE Advanced Lithography.

Synthesis and evaluation of novel organoelement resists for EUV lithography

Franco Cerrina, Christopher K. Ober, Jangho Shin, 2003, SPIE Advanced Lithography.