J. Kim

Two-step dopant diffusion study performed in two dimensions by scanning capacitance microscopy and TSUPREM IV

J. Kim, J. McMurray, C. Williams, 1998 .

Silicon nanowires with controlled sidewall profile and roughness fabricated by thin-film dewetting and metal-assisted chemical etching

N. Fang, P. Ferreira, J. Kim, 2013, Nanotechnology.

Direct comparison of two-dimensional dopant profiles by scanning capacitance microscopy with TSUPREM4 process simulation

J. Kim, J. McMurray, C. Williams, 1998 .

Sub-0.1 μm nitride hard mask open process without precuring the ArF photoresist

J. Moon, W. S. Lee, J. Kim, 2003 .

Epitaxial staircase structure for the calibration of electrical characterization techniques

Trudo Clarysse, Wilfried Vandervorst, Clayton C. Williams, 1998 .