K. Iyanagi

Topography simulations for contact formation involving reactive ion etching, sputtering and chemical vapor deposition

S. Takagi, S. Onoue, K. Iyanagi, 2005 .

Evaluation of Gate Oxide Damage Caused by Ionization Magnetron Sputtering

K. Iyanagi, S. Hayase, S. Matsunaka, 2007 .

Two-Dimensional Modeling of Spatiotemporal Structure of Inductively Coupled Plasma

K. Iyanagi, T. Makabe, N. Nakano, 1999 .

Predictable topography simulation of SiO2 etching by C5F8 gas combined with a plasma simulation, sheath model and chemical reaction model

S. Takagi, S. Onoue, K. Iyanagi, 2003 .

New Inductively Coupled Plasma System Using Divided Antenna for Photoresist Ashing

K. Iyanagi, Hiroaki Kobayashi, T. Nagatomo, 2004 .