T. Shinmura

Topography simulations for contact formation involving reactive ion etching, sputtering and chemical vapor deposition

S. Takagi, S. Onoue, K. Iyanagi, 2005 .

Deposition and characterization of gold thin films on Si by CF4+O2 gas microwave plasma

Y. Taniguchi, T. Shinmura, 1998 .

Study on Surface Modification of Indium Tin Oxide and Resist Surfaces Using CF4/O2 Plasma for Manufacturing Organic Light-Emitting Diodes by Inkjet Printing

S. Takagi, T. Shinmura, M. Fujihira, 2008 .

Simulations and Experiments on O Density and Distribution in Ashing Process Using Surface Plasma Excited by Microwave

S. Takagi, T. Shinmura, O. Yamazaki, 2013 .

Quantum Chemical Molecular Dynamics Simulation of the Plasma Etching Processes

Momoji Kubo, Akira Miyamoto, Masaaki Kanoh, 2003 .

Predictable topography simulation of SiO2 etching by C5F8 gas combined with a plasma simulation, sheath model and chemical reaction model

S. Takagi, S. Onoue, K. Iyanagi, 2003 .

Selective Plasma Surface Modification of Resist for Patterning Hydrophobic and Hydrophilic Regions

T. Shinmura, K. Sugita, Y. Kataoka, 2008 .

A sputter equipment simulation system including molecular dynamical target atom scattering model

T. Shinmura, H. Yamada, T. Ohta, 1995, Proceedings of International Electron Devices Meeting.