J. Han

发表

Al-Doped TiO 2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors * * N

C. Hwang, Seungwu Han, S. Kim, 2008 .

A theoretical model for Schottky diodes for excluding the sneak current in cross bar array resistive memory

Cheol Seong Hwang, Jun Yeong Seok, Gun Hwan Kim, 2010, Nanotechnology.

Effect of Ag Concentration Dispersed in HfOx Thin Films on Threshold Switching

Byung Joon Choi, J. Han, W. Jeong, 2020, Nanoscale research letters.

Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials

Byung Joon Choi, C. Hwang, S. Kim, 2013 .

Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin, diethylzinc, and oxygen plasma

J. Han, K. An, Seongjun Kim, 2015 .

Atomic-layer-deposited SnO film using novel Sn(dmamb)2 precursor for p-channel thin film transistor

J. Han, B. Park, S. Han, 2021 .

Schottky diode with excellent performance for large integration density of crossbar resistive memory

Jong-Ho Lee, Cheol Seong Hwang, Kyung Jean Yoon, 2012 .

Controlling the initial growth behavior of SrTiO3 films by interposing Al2O3 layers between the film and the Ru substrate

C. Hwang, Sang Woon Lee, J. Han, 2012 .

Strain evolution of each type of grains in poly-crystalline (Ba,Sr)TiO3 thin films grown by sputtering

C. Hwang, J. Han, J. Yoon, 2012, Scientific Reports.

Trimethylsilylcyclopentadienyl tris(dimethylamino)zirconium as a single-source metal precursor for the atomic layer deposition of ZrxSi1-xO4

J. Han, M. Park, K. An, 2014 .

Reduction of the Hysteresis Voltage in Atomic‐Layer‐Deposited p‐Type SnO Thin‐Film Transistors by Adopting an Al2O3 Interfacial Layer

In Won Yeu, C. Hwang, J. Han, 2019, Advanced Electronic Materials.

Chemistry of active oxygen in RuOx and its influence on the atomic layer deposition of TiO2 films

C. Hwang, S. Kim, J. Han, 2014 .

Band gap engineering of atomic layer deposited ZnxSn1‐xO buffer for efficient Cu(In,Ga)Se2 solar cell

J. Yun, J. Han, B. Park, 2018 .

Strong hydrophobizer: laterally chemisorbed low-molecular-weight polydimethylsiloxane.

J. Han, J. Oh, Jeong-O Lee, 2015, Chemical communications.

Facile synthesis of AlOx dielectrics via mist-CVD based on aqueous solutions

Dong Hyun Kim, Jin-seong Park, J. Han, 2017 .

Electrical properties of TiO 2 -based MIM capacitors deposited by TiCl 4 and TTIP based atomic layer deposition processes

C. Hwang, J. Han, J. Aarik, 2011 .

Thermal atomic layer deposition of In2O3 thin films using dimethyl(N-ethoxy-2,2-dimethylcarboxylicpropanamide)indium and H2O

J. Han, B. Park, C. G. Kim, 2017 .

Effect of crystalline structure of TiO2 substrates on initial growth of atomic layer deposited Ru thin films

C. Hwang, S. Kim, J. Han, 2011 .

The niobium doping effects on resistance degradation of strontium titanate thin film capacitors

Jack C. Lee, J. Han, S. Gopalan, 1999 .

Performance of exchange-correlation functionals in density functional theory calculations for liquid metal: A benchmark test for sodium.

J. Han, T. Oda, 2018, The Journal of chemical physics.

Novel Heteroleptic Tin(II) Complexes Capable of Forming SnO and SnO2 Thin Films Depending on Conditions Using Chemical Solution Deposition

J. Han, B. Park, S. Han, 2021, ACS omega.

Phase-gradient atomic layer deposition of TiO2 thin films by plasma-induced local crystallization

J. Han, Jaehyeong Lee, J. An, 2021 .

Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

J. Han, B. Park, S. Han, 2020 .

Ruthenocene Precursors for Ruthenium-Containing Thin-Film Deposition: An Example of Solvent Nucleophilic Attack on Fulvene

J. Han, B. Park, S. Han, 2017 .

Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O

J. Han, B. Park, Seongtak Kim, 2014 .

Reaction Chemistry during the Atomic Layer Deposition of Sc2O3 and Gd2O3 from Sc(MeCp)3, Gd(iPrCp)3, and H2O

C. Adelmann, A. Franquet, A. Delabie, 2014 .

Atomic layer deposition of indium oxide thin film from a liquid indium complex containing 1-dimethylamino-2-methyl-2-propoxy ligands

Jin-seong Park, J. Han, B. Park, 2016 .

Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal–Insulator–Metal Capacitors

C. Hwang, S. Kim, Sang Woon Lee, 2013 .

Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors

Jae Hyuck Jang, C. Hwang, S. Kim, 2011 .

SnO-decorated TiO2 nanoparticle with enhanced photocatalytic performance for methylene blue degradation

Byung Joon Choi, J. Han, Yoon-Kee Kim, 2019, Applied Surface Science.

Nanosession: Atomic Layer Deposition

R. Waser, C. Hwang, N. Aslam, 2013 .

Study on Initial Growth Behavior of RuO2 Film Grown by Pulsed Chemical Vapor Deposition: Effects of Substrate and Reactant Feeding Time

C. Hwang, S. Kim, Sang Woon Lee, 2012 .

Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido)tantalum complex

Jin-seong Park, J. Han, B. Park, 2016 .

Synthesis of Mono-Imido Tungsten Complexes Directly from WCl6

J. Han, B. Park, C. G. Kim, 2016 .

Improvement in the leakage current characteristic of metal-insulator-metal capacitor by adopting RuO2 film as bottom electrode

C. Hwang, S. Kim, Sang Woon Lee, 2011 .

Growth of Cu2S thin films by atomic layer deposition using Cu(dmamb)2 and H2S

J. Han, B. Park, C. G. Kim, 2018, Applied Surface Science.

Phase-controlled SnO2 and SnO growth by atomic layer deposition using Bis(N-ethoxy-2,2-dimethyl propanamido)tin precursor

Jin-seong Park, J. Han, B. Park, 2019, Ceramics International.

Permittivity Enhanced Atomic Layer Deposited HfO2 Thin Films Manipulated by a Rutile TiO2 Interlayer

C. Hwang, S. Kim, Minha Seo, 2010 .

Polycrystalline and high purity SnO2 films by plasma-enhanced atomic layer deposition using H2O plasma at very low temperatures of 60–90 °C

J. Han, B. Park, S. Han, 2021, Vacuum.

Atomic Layer Deposition and Electrical Properties of SrTiO3 Thin Films Grown Using Sr ( C11H19O2 ) 2, Ti ( Oi-C3H7 ) 4, and H2O

C. Hwang, Sang Woon Lee, J. Han, 2007 .

Impact of bimetal electrodes on dielectric properties of TiO2 and Al-doped TiO2 films.

C. Hwang, S. Kim, J. Han, 2012, ACS applied materials & interfaces.

Seed layer mediated growth of high dielectric and low leakage BaTiO3 thin film using two-step sputtering process

J. Han, Wang Kang, J. Ahn, 2021 .

Atomic Layer Deposition of Cu2SnS3 Thin Films: Effects of Composition and Heat Treatment on Phase Transformation

J. Yun, J. Han, B. Park, 2021, Chemistry of Materials.

N‐Alkoxy Carboxamide Stabilized Tin(II) and Germanium(II) Complexes for Thin‐Film Applications

J. Han, B. Park, C. G. Kim, 2016 .

Electronic Conduction Mechanism of SrTiO3 Thin Film Grown on Ru Electrode by Atomic Layer Deposition

C. Hwang, Sang Woon Lee, J. Han, 2009 .

Improved Initial Growth Behavior of SrO and SrTiO3 Films Grown by Atomic Layer Deposition Using {Sr(demamp)(tmhd)}2 as Sr-Precursor

C. Hwang, Sang Woon Lee, J. Han, 2015 .

Influences of a Crystalline Seed Layer during Atomic Layer Deposition of SrTiO3 Thin Films Using Ti ( O-iPr ) 2 ( thd ) 2, Sr ( thd ) 2, and H2O

C. Hwang, Sang Woon Lee, J. Han, 2008 .

Enhanced electrical properties of SrTiO3 thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications

C. Hwang, Sang Woon Lee, J. Han, 2008 .

Heteroleptic strontium complexes stabilized by donor-functionalized alkoxide and β-diketonate ligands.

J. Han, B. Park, M. Lah, 2015, Dalton transactions.

Indium complexes bearing donor-functionalized alkoxide ligands as precursors for indium oxide thin films

J. Han, B. Park, C. G. Kim, 2017 .

Capacitors with an Equivalent Oxide Thickness of <0.5 nm for Nanoscale Electronic Semiconductor Memory

Sang Woon Lee, Cheol Seong Hwang, Seungwu Han, 2010 .

Synthesis of SnS Thin Films by Atomic Layer Deposition at Low Temperatures

Cheol Seong Hwang, Ji-Won Choi, Jin Sang Kim, 2017 .

Improved dielectric constant and leakage current characteristics of BaTiO3 thin film on SrRuO3 seed layer

J. Han, W. Kang, Eun Chong Ko, 2021, Journal of Alloys and Compounds.

Growth of Conductive SrRuO3 Films by Combining Atomic Layer Deposited SrO and Chemical Vapor Deposited RuO2 Layers

Sang Woon Lee, Cheol Seong Hwang, Woongkyu Lee, 2012 .

(Invited) ALD and Pulsed-CVD of Ru, RuO2, and SrRuO3

C. Hwang, J. Han, 2013 .

Pulsed-Chemical Vapor Deposition of Ruthenium and Ruthenium Dioxide Thin Films using RuO4 Precursor for the DRAM Capacitor Electrode

C. Hwang, G. Choi, Sang Young Lee, 2009 .

Chemical states of 3d transition metal impurities in a liquid lead-bismuth eutectic analyzed using first principles calculations.

J. Han, T. Oda, 2017, Physical chemistry chemical physics : PCCP.

Manipulating superconducting phases via current-driven magnetic states in rare-earth-doped CaFe2As2

J. Han, T. Park, Soohyeon Shin, 2018, NPG Asia Materials.

E ﬀ ect of Oxygen Source on the Various Properties of SnO 2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition

J. Han, B. Park, S. Han, 2020 .

Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films

J. Han, Jinsang Kim, S. Baek, 2017 .

Highly sensitive flexible NO2 sensor composed of vertically aligned 2D SnS2 operating at room temperature

Gwang Su Kim, C. Hwang, S. Kim, 2020 .

Al‐Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

Cheol Seong Hwang, Seungwu Han, Jeong Hwan Han, 2008 .

Atomic-layer-deposited SnO2 on Pt/C prevents sintering of Pt nanoparticles and affects the reaction chemistry for the electrocatalytic glycerol oxidation reaction

J. Han, H. J. Kim, Youngmin Kim, 2020 .

SnO2 thin films grown by atomic layer deposition using a novel Sn precursor

D. Jeong, S. Kim, J. Han, 2014 .

Thermal atomic layer deposition of molybdenum carbide films using bis(ethylbenzene)molybdenum and H2

J. Han, W. Kang, J. Ahn, 2023, Journal of Vacuum Science & Technology A.

High Field-Effect Mobility and On/Off Current Ratio of p-Type ALD SnO Thin-Film Transistor

S. Kim, J. Han, B. Park, 2023, ACS Applied Electronic Materials.

Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition

C. Hwang, S. Kim, J. Han, 2010 .

Growth of RuO2 Thin Films by Pulsed-Chemical Vapor Deposition Using RuO4 Precursor and 5% H2 Reduction Gas

C. Hwang, S. Kim, Sang Woon Lee, 2010 .

Cation-Regulated Transformation for Continuous Two-Dimensional Tin Monosulfide

C. Hwang, S. Kim, J. Han, 2020 .

Wafer-Scale, Conformal, and Low-Temperature Synthesis of Layered Tin Disulfides for Emerging Non-Planar and Flexible Electronics.

S. Kim, J. Han, S. Baek, 2019, ACS applied materials & interfaces.

Low-temperature wafer-scale synthesis of two-dimensional SnS2.

S. Kim, J. Han, S. Baek, 2018, Nanoscale.

Front End of the Line Process

C. Hwang, A. Delabie, J. Han, 2014 .

Effects of SnO2 layer coated on carbon nanofiber for the methanol oxidation reaction

Byung Joon Choi, Dong Ha Kim, J. Han, 2018, Ceramics International.

Atomic layer deposition of ZnO layers on Bi2Te3 powders: Comparison of gas fluidization and rotary reactors

Byung Joon Choi, J. Han, Min Hwan Lee, 2022, Ceramics International.

Atomic Layer Deposition for Powder Coating

Byung Joon Choi, J. Han, Seok Choi, 2019, Journal of Korean Powder Metallurgy Institute.

New Heteroleptic Cobalt Precursors for Deposition of Cobalt-Based Thin Films

J. Han, B. Park, M. Lah, 2017, ACS omega.

The structures of low dielectric constant SiOC thin films prepared by direct and remote plasma enhanced chemical vapor deposition

J. Han, Jaeyeong Heo, H. Kim, 2007 .

Substrate Surface Modification for Enlarging Two-Dimensional SnS Grains at Low Temperatures

C. Hwang, J. Han, S. Baek, 2020 .

Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Thin Films from a Zero-Valent (1,5-Hexadiene)(1-isopropyl-4-methylbenzene)ruthenium Complex and O2

J. Han, B. Park, K. An, 2014 .

Low-resistivity ruthenium metal thin films grown via atomic layer deposition using dicarbonyl-bis(5-methyl-2,4-hexanediketonato)ruthenium(II) and oxygen

J. Han, Hakseung Rhee, Eun Chong Ko, 2023, Materials Science in Semiconductor Processing.

Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO4 Precursor

C. Hwang, G. Choi, Sang Young Lee, 2009 .

Local Epitaxial Growth of Ru Thin Films by Atomic Layer Deposition at Low Temperature

Jae Hyuck Jang, C. Hwang, S. Kim, 2011 .

Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO4 Precursor.

C. Hwang, G. Choi, Sang Young Lee, 2009 .

Simultaneous etching of underlying metal oxide and sulfide thin films during Cu2S atomic layer deposition

J. Han, B. Park, S. Han, 2020 .

Trinuclear magnesium complexes stabilized by aminoalkoxide ligands

J. Han, B. Park, C. G. Kim, 2016 .

Synthesis of novel tin complexes using functionalized oxime ligands

J. Han, B. Park, S. Han, 2016 .

High-Performance Thin-Film Transistors of Quaternary Indium-Zinc-Tin Oxide Films Grown by Atomic Layer Deposition.

Byung Joon Choi, C. Hwang, S. Kim, 2019, ACS applied materials & interfaces.

Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application.

Jin-seong Park, J. Han, B. Park, 2016, ACS applied materials & interfaces.

Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis(ethylcyclopentadienyl)magnesium precursor

Byung Joon Choi, J. Han, W. Kang, 2020, Ceramics International.

Nanoscale characterization of TiO(2) films grown by atomic layer deposition on RuO(2) electrodes.

C. Hwang, L. Frey, M. Rommel, 2014, ACS applied materials & interfaces.

Highly Improved Uniformity in the Resistive Switching Parameters of TiO2 Thin Films by Inserting Ru Nanodots

Cheol Seong Hwang, Kyung Jean Yoon, Ji Sim Jung, 2013, Advanced materials.

Ozone-Based Atomic Layer Deposition of Gd2O3 from Tris(isopropyl-cyclopentadienyl)gadolinium: Growth Characteristics and Surface Chemistry†

C. Adelmann, A. Franquet, T. Conard, 2015 .

Atomic layer deposition of pure In2O3 films for a temperature range of 200–300 °C using heteroleptic liquid In(DMAMP)2(OiPr) precursor

J. Han, B. Park, Taek‐Mo Chung, 2020 .

Effects of in‐situ molecular oxygen exposure on the modulation of electrical properties of zinc oxide thin films grown by atomic layer deposition

J. Han, Jaeyeong Heo, Hui Kyung Park, 2015 .

Fabrication of low-voltage ZnO varistors by a two-step process

Doh-Yeon Kim, J. Han, Dong Hoon Lee, 1995 .

Role of Interfacial Reaction in Atomic Layer Deposition of TiO2 Thin Films Using Ti(O-iPr)2(tmhd)2 on Ru or RuO2 Substrates

C. Hwang, S. Kim, Sang Woon Lee, 2011 .

Atomic layer deposition of TiO2 and Al‐doped TiO2 films on Ir substrates for ultralow leakage currents

C. Hwang, S. Kim, J. Han, 2011 .

Electrically Benign Dry-Etching Method for Rutile TiO2 Thin-Film Capacitors with Ru Electrodes

C. Hwang, K. Kim, G. Choi, 2010 .

Electromigration Reliability of Barrierless Ruthenium and Molybdenum for Sub-10 nm Interconnection

Myeong Won Son, Kyung Min Kim, Byong‐Guk Park, 2023, ACS Applied Electronic Materials.

The mechanism for the suppression of leakage current in high dielectric TiO2 thin films by adopting ultra-thin HfO2 films for memory application

C. Hwang, S. Kim, Minha Seo, 2011 .

Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O3: growth behaviour and film characteristics

K. Opsomer, C. Adelmann, A. Franquet, 2013 .

Low-temperature wafer-scale synthesis of two-dimensional SnS2.

S. Kim, J. Han, S. Baek, 2018, Nanoscale.

Tunable solid electrolyte interphase formation on SiO anodes using SnO artificial layers for Lithium-ion batteries

Byung Joon Choi, J. Han, S. Baek, 2021 .

High-Performance Thin-Film Transistors of Quaternary Indium-Zinc-Tin Oxide Films Grown by Atomic Layer Deposition.

Byung Joon Choi, C. Hwang, S. Kim, 2019, ACS applied materials & interfaces.

Fatigue strength of a tensile-shear loaded clinched joint made from an al-5052 alloy sheet

J. Han, Ho-Kyung Kim, Won-Tae Hwang, 2020 .