G. de Cock

Drain current variability and MOSFET parameters correlations in planar FDSOI technology

M. Belleville, G. Ghibaudo, O. Weber, 2011, 2011 International Electron Devices Meeting.

Characterisation of ultra-shallow junctions using advanced SIMS, SRP and HRTEM techniques

G. de Cock, T. Cullis, T. Wang, 1998, 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).

Uniform spike anneals of ultra low energy boron implants using xR LEAP and RTP Centura XE/sub plus/: ramp rate effects up to 150/spl deg/C/sec

G. de Cock, T. Cullis, M. Foad, 1998, 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144).