J. Colonell

发表

The Vertical Replacement-Gate (VRG) MOSFET: a 50-nm vertical MOSFET with lithography-independent gate length

W. Lai, F. Baumann, D. Monroe, 1999, International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318).

Charging damage in thin gate-oxides-better or worse?

J. T. Clemens, H. Vaidya, C. Liu, 1998, 1998 3rd International Symposium on Plasma Process-Induced Damage (Cat. No.98EX100).

Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage

M. V. Malyshev, V. M. Donnelly, J. Colonell, 2000 .

Reduced 1/f noise and g/sub m/ degradation for sub-0.25 /spl mu/m MOSFETs with 25 /spl Aring/-50 /spl Aring/ gate oxides grown on nitrogen implanted Si substrates

J. T. Clemens, G. Alers, C. Liu, 1997, 1997 55th Annual Device Research Conference Digest.

Dynamics of pulsed-power chlorine plasmas

M. V. Malyshev, V. M. Donnelly, J. Colonell, 1999 .

Dynamics of NO reduction by H2 on Rh(111): Velocity and angular distributions of the N2 product

S. Sibener, K. Gibson, J. Colonell, 1996 .

The decomposition of NO2 on Rh(111): product NO velocity and angular intensity distributions

S. Sibener, K. Gibson, J. Colonell, 1999 .

Coverage dependence of the kinetics for H2 desorption from Rh(111)

T. J. Curtiss, S. Sibener, J. Colonell, 1996 .

Carbon monoxide oxidation on Rh(111): Velocity and angular distributions of the CO2 product

S. Sibener, K. Gibson, J. Colonell, 1995 .

Enabling shallow trench isolation for 0.1 /spl mu/m technologies and beyond

J. T. Clemens, E. J. Lloyd, H. Vaidya, 1999, 1999 Symposium on VLSI Technology. Digest of Technical Papers (IEEE Cat. No.99CH36325).

Velocity distributions of recombinatively desorbed O2 originating from surface and sub-surface oxygen/Rh(111)

S. Sibener, K. Gibson, J. Colonell, 1995 .

Langmuir probe studies of a transformer-coupled plasma, aluminum etcher

M. V. Malyshev, V. M. Donnelly, N. A. Ciampa, 1999 .

Oxidation of H on Rh(111): H2O product velocity and angular distributions

S. Sibener, K. Gibson, J. Colonell, 1995 .

Trace Rare Gases Optical Emission Spectroscopy for Determination of Electron Temperatures and Species Concentrations in Chlorine-Containing Plasmas

M. V. Malyshev, V. M. Donnelly, N. A. Ciampa, 1998 .

Mask charging and profile evolution during chlorine plasma etching of silicon

M. V. Malyshev, V. M. Donnelly, F. Klemens, 2000 .

Impact of plasma-charging damage polarity on MOSFET noise

W.Y.C. Lai, C. Liu, W. Lai, 1997, International Electron Devices Meeting. IEDM Technical Digest.

Intrinsic and stress-induced traps in the direct tunneling current of 2.3-3.8 nm oxides and unified characterization methodologies of sub-3 nm oxides

G. Alers, H. Vaidya, C. Liu, 1997, International Electron Devices Meeting. IEDM Technical Digest.

An introduction to plasma etching for VLSI circuit technology

Nace Layadi, Jennifer I. Colonell, John Tseng-Chung Lee, 1999, Bell Labs Technical Journal.

Reduction of plasma induced damage in an inductively coupled plasma using pulsed source power

M. V. Malyshev, V. M. Donnelly, J. Colonell, 2000 .

Gate-oxide degradation from source/drain (S/D) boron diffusion

H. Vaidya, C. Liu, W. Lai, 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).