H. Maynard

发表

The Vertical Replacement-Gate (VRG) MOSFET: a 50-nm vertical MOSFET with lithography-independent gate length

W. Lai, F. Baumann, D. Monroe, 1999, International Electron Devices Meeting 1999. Technical Digest (Cat. No.99CH36318).

Miniature fuel cells for portable power: Design considerations and challenges

J. Meyers, H. Maynard, 2002 .

Thin-film resistor fabrication for InP technology applications

R. Kopf, D. Jacobson, N. Weimann, 2002 .

Plasma doping of high aspect ratio structures

H. Maynard, D. Raj, J. Lee, 2014, 2014 20th International Conference on Ion Implantation Technology (IIT).

New alternative graphing methods for thin-film interferometry data

N. Hershkowitz, H. Maynard, 1993 .

Multiwavelength ellipsometry for real-time process control of the plasma etching of patterned samples

J.T.-C. Lee, H. Maynard, N. Layadi, 1997 .

Investigation of CVD SiCOH low-k time-dependent dielectric breakdown at 65nm node technology

J. Gill, M. Shinosky, T. Ema, 2005, 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual..

Metal stack etching using a helical resonator plasma

H. Maynard, C. Labelle, J. T. Lee, 1996 .

Comparison of advanced plasma sources for etching applications. V. Polysilicon etching rate, uniformity, profile control, and bulk plasma properties in a helical resonator plasma source

F. Klemens, J.T.-C. Lee, H. Maynard, 1996 .

Band-Edge Work Function Obtained by Plasma Doping TiN Metal Gate for nMOS Device Application

Tianchun Ye, Q. Liang, H. Maynard, 2018, IEEE Transactions on Electron Devices.

Etching rate characterization of SiO2 and Si using ion energy flux and atomic fluorine density in a CF4/O2/Ar electron cyclotron resonance plasma

James W. Taylor, N. Hershkowitz, H. Maynard, 1993 .

Design considerations for miniaturized PEM fuel cells

Jeremy P. Meyers, Helen Louise Maynard, J. Meyers, 2002 .

Control of the radio-frequency wave form at the chuck of an industrial oxide-etch reactor

H. Maynard, L. Berry, M. Pendley, 2000 .

Ultra-low NMOS contact resistivity using a novel plasma-based DSS implant and laser anneal for post 7 nm nodes

M. Chudzik, F. Khaja, H. Maynard, 2016, 2016 IEEE Symposium on VLSI Technology.

Plasma characterization and process control diagnostics

N. Hershkowitz, N. Hershkowitz, H. Maynard, 1993 .

Experiments with back side gas cooling using an electrostatic wafer holder in an electron cyclotron resonance etching tool

Noah Hershkowitz, James W. Taylor, Karen H. R. Kirmse, 1994 .

Plasma etching of submicron devices: in situ monitoring and control by multi-wavelength ellipsometry

J.T.-C. Lee, H. Maynard, N. Layadi, 1998 .

Plasma Etching Endpointing by Monitoring Radio‐Frequency Power Systems with an Artificial Neural Network

Helen Louise Maynard, E. Rietman, J.T.-C. Lee, 1996 .