H. Rhee

发表

Bulk planar 20nm high-k/metal gate CMOS technology platform for low power and high performance applications

S. Choi, C. Chung, Y. Son, 2011, 2011 International Electron Devices Meeting.

Negative bias temperature instability of carrier-transport enhanced pMOSFET with performance boosters

N. Lee, D. Shin, H. Rhee, 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

Electrical Characteristics of Bulk FinFET According to Spacer Length

C. Shin, H. Rhee, J. Yi, 2020, Electronics.

Combination of ultraviolet exposure and thermal post-treatment to obtain high quality HfO2 thin films

H. Rhee, J. Yi, E. Cho, 2020 .

Improved 1/f Noise Characteristics in Locally Strained Si CMOS Using Hydrogen-Controlled Stress Liners and Embedded SiGe

Y. H. Jung, N. Lee, H. Park, 2006, 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers..

Cobalt Metallorganic Chemical Vapor Deposition and Formation of Epitaxial CoSi2 Layer on Si(100) Substrate

B. Ahn, H. Rhee, 1999 .

In situ growth of an epitaxial CoSi2 layer on a Si (100) substrate by reactive chemical-vapor deposition using a cobalt metallorganic source

B. Ahn, H. Rhee, 1999 .

Epitaxial growth of a (100) CoSi2 layer from carbonic cobalt films deposited on (100) Si substrate using an organometallic source

B. Ahn, H. Rhee, T. Jang, 1999 .

Formation of Tisi2 Thin Films from Chemical Vapor Deposition Using TiI4

B. Ahn, H. Rhee, J. Baek, 1998 .

Improved Morphological Stability of CoSi2 Layer by In Situ Growth on Polycrystalline Silicon Using Reactive Chemical Vapor Deposition

B. Ahn, H. Rhee, Heui-Seung Lee, 2002 .

Growth of in situ CoSi2 layer by metalorganic chemical vapor deposition on Si tips and its field-emission properties

B. Ahn, H. Rhee, B. Han, 2001 .

Silicon Field Emission Arrays Coated with CoSi 2 Layer Grown by Reactive Chemical Vapor Deposition

B. Ahn, H. Rhee, B. Han, 2000 .

Hydrogen plasma pretreatment effect on the deposition of aluminum thin films from metalorganic chemical vapor deposition using dimethylethylamine alane

B. Ahn, H. Rhee, T. Jang, 1999 .

Pre-treatment effect on aluminum thin films deposition from CVD using dimethylethylamine alane

B. Ahn, H. Rhee, T. Jang, 1998 .

Growth behavior and thermal stability of epitaxial CoSi2 layer from cobalt–carbon films on (100) Si substrate

B. Ahn, D. Sohn, H. Rhee, 1999 .

Si FinFET based 10nm technology with multi Vt gate stack for low power and high performance applications

Y. S. Nam, J. H. Lee, K. H. Lee, 2016, 2016 IEEE Symposium on VLSI Technology.