I. Oshiyama

Extreme High-Performance n- and p-MOSFETs Boosted by Dual-Metal/High-k Gate Damascene Process using Top-Cut Dual Stress Liners on (100) Substrates

Y. Tagawa, M. Saito, N. Nagashima, 2007, 2007 IEEE International Electron Devices Meeting.

High Performance and High Reliability Dual Metal CMOS Gate Stacks Using Novel High-k Bi-layer Control Technique

T. Ando, Y. Tagawa, M. Saito, 2007, 2007 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA).

IR sensitivity enhancement of CMOS Image Sensor with diffractive light trapping pixels

Suguru Saito, Itaru Oshiyama, Hayato Iwamoto, 2017, Scientific Reports.

Effect of nitrogen incorporation in ferromagnetic (Ga,Mn)As epilayers

I. Oshiyama, H. Munekata, T. Kondo, 2005 .

IR sensitivity enhancement of CMOS Image Sensor with diffractive light trapping pixels

T. Hirano, H. Iwamoto, I. Oshiyama, 2017, Scientific Reports.

Study on mechanism of crystallization in HfO2 films on Si substrates by in-depth profile analysis using photoemission spectroscopy

Yun Sun, Shiyu Sun, D. Lee, 2009 .

Visible Light Sensitivity Enhancement of CMOS Image Sensor with Pseudo High Refractive Index Film Integrated by Directed Self-Assembly Process

T. Hirano, H. Iwamoto, I. Oshiyama, 2021, 2021 5th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).