T. Morel

Low leakage and low variability Ultra-Thin Body and Buried Oxide (UT2B) SOI technology for 20nm low power CMOS and beyond

A. Toffoli, J. Cluzel, O. Faynot, 2010, 2010 Symposium on VLSI Technology.

Ultra-Thin (4nm) Gate-All-Around CMOS devices with High-k/Metal for Low Power Multimedia Applications

Nicolas Loubet, Stephane Monfray, G. Bidal, 2010 .

Fractionalization and anyonic statistics in the integer quantum Hall collider

T. Morel, Juneseo Lee, C. Mora, 2021, Physical Review B.

Double-periodic Josephson junctions in a quantum dissipative environment

T. Morel, C. Mora, 2019, Physical Review B.