S. Yamada

High performance CMOSFET technology for 45nm generation and scalability of stress-induced mobility enhancement technique

K. Yahashi, A. Oishi, T. Komoda, 2006, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

Preparation of Boron and Boron Phosphide Films by Photo- and Thermal Chemical Vapor Deposition Processes

S. Yamada, K. Hirata, T. Yokoyama, 2000 .

A channel-erasing 1.8-V-only 32-Mb NOR flash EEPROM with a bitline direct sensing scheme

H. Watanabe, S. Yamada, Y. Takano, 2000, IEEE Journal of Solid-State Circuits.