Charles N. Archie

发表

Modeling and experimental aspects of apparent beam width as an edge resolution measure

Charles N. Archie, Jeremiah R. Lowney, Michael T. Postek, 1999, Advanced Lithography.

Correlating scatterometry to CD-SEM and electrical gate measurements at the 90-nm node using TMU analysis

Charles N. Archie, Matthew Sendelbach, Bill Banke, 2004, SPIE Advanced Lithography.

Characteristics of accuracy for CD metrology

Charles N. Archie, George W. Banke, 1999, Advanced Lithography.

Contact holes: a challenge for signal collection efficiency and measurement algorithms

Charles N. Archie, Eric P. Solecky, 1997, Advanced Lithography.

Holistic metrology approach: hybrid metrology utilizing scatterometry, critical dimension-atomic force microscope and critical dimension-scanning electron microscope

Peter Ebersbach, Charles N. Archie, Alok Vaid, 2011 .

New apparent beam width artifact and measurement methodology for CD-SEM resolution monitoring

Charles N. Archie, Robert M. Cogley, Eric P. Solecky, 2003, SPIE Advanced Lithography.

Reconciling measurements in AFM reference metrology when using different probing techniques

Charles N. Archie, Johann Foucher, Narender Rana, 2011, Advanced Lithography.

Practical monitor and control of SEM astigmatism in manufacturing

Charles N. Archie, Sandra R. Dupuis, Eric P. Solecky, 2001, SPIE Advanced Lithography.

Image processing for SEMs: is this the way to go for CD metrology?

Charles N. Archie, Eric P. Solecky, 1999, Advanced Lithography.

Investigation on the mechanism of the 193-nm resist linewidth reduction during the SEM measurement

Charles N. Archie, Wu-Song Huang, K. Rex Chen, 2001, SPIE Advanced Lithography.

Reducing measurement uncertainty drives the use of multiple technologies for supporting metrology

Charles N. Archie, Eric P. Solecky, Matthew Sendelbach, 2004, SPIE Advanced Lithography.

Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-um lithography

Charles N. Archie, Michael T. Postek, Andras E. Vladar, 2000, Advanced Lithography.

Total measurement uncertainty and total process precision evaluation of a structural metrology approach to monitoring post-CMP processes

Charles N. Archie, Wei Lu, Stacey Stone, 2004, SPIE Advanced Lithography.

Characterizing and understanding stray tilt: the next major contributor to CD SEM tool matching

Charles N. Archie, Ofer Adan, Roger Cornell, 2003, SPIE Advanced Lithography.

Feedforward of mask open measurements on an integrated scatterometer to improve gate linewidth control

Charles N. Archie, Merritt Funk, Matthew Sendelbach, 2004, SPIE Advanced Lithography.

Scatterometry measurement precision and accuracy below 70 nm

Charles N. Archie, Matthew Sendelbach, M. Sendelbach, 2003, SPIE Advanced Lithography.

Helios compact synchrotron x-ray source: one year of operation at ALF

Charles N. Archie, David E. Andrews, 1993, Advanced Lithography.

Toward a unified advanced CD-SEM specification for sub-0.18-μm technology

Charles N. Archie, Michael T. Postek, Herschel M. Marchman, 1998, Advanced Lithography.

Challenges of implementing contour modeling in 32nm technology

Charles N. Archie, Cyrus E. Tabery, Daniel Fischer, 2008, SPIE Advanced Lithography.

Monitoring printing fidelity with image correlation measurements on the CD SEM

Charles N. Archie, Eric P. Solecky, George W. Banke, 2001, SPIE Advanced Lithography.

Improving sub-150-nm lithography and etch CD-SEM correlations to AFM and electrical test

Charles N. Archie, Eric P. Solecky, Jason Mayer, 2002, SPIE Advanced Lithography.

Three-dimensional top-down metrology: a viable alternative to AFM or cross-section?

Charles N. Archie, Roger Cornell, Eric P. Solecky, 2001, SPIE Advanced Lithography.

Characterization of 32nm node BEOL grating structures using scatterometry

Charles N. Archie, Alok Vaid, Pedro Herrera, 2008, SPIE Advanced Lithography.

Benchmarking of Advanced CD-SEMs Against the New Unified Specification for Sub-0.18 Micrometer Lithography | NIST

Charles N. Archie, Michael T. Postek, John A. Allgair, 2000 .

Review of current progress in nanometrology with the helium ion microscope

Charles N. Archie, Michael T. Postek, András E. Vladár, 2011 .

Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version) | NIST

Charles N. Archie, Michael T. Postek, Bhanwar Singh, 2000 .