Michael T. Postek

发表

Modeling and experimental aspects of apparent beam width as an edge resolution measure

Charles N. Archie, Jeremiah R. Lowney, Michael T. Postek, 1999, Advanced Lithography.

Photomask dimensional metrology in the scanning electron microscope, part I: Has anything really changed?

Michael T. Postek, Andra´s E. Vlada´r, Marylyn Hoy Bennett, 2004 .

Potentials for inspection and metrology of MEMS using a combined scanning electron microscope (SEM) and proximal probe microscope (PPM)

Michael T. Postek, 1997, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.

NNI Workshop Instrumentation and Metrology for Nanotechnology | NIST

Michael T. Postek, J J. Pellegrino, 2004 .

SEM performance evaluation using the sharpness criterion

Michael T. Postek, Andras E. Vladar, 1996, Advanced Lithography.

Statistical measure for the sharpness of SEM images

Michael T. Postek, Nien-Fan Zhang, Robert D. Larrabee, 1997, Advanced Lithography.

New way of handling dimensional measurement results for integrated circuit technology

Michael T. Postek, John S. Villarrubia, Andras E. Vladar, 2003, SPIE Advanced Lithography.

Proceedings of the ASME 2009 International Manufacturing Science and Engineering Conference | NIST

Michael T. Postek, Ranga Komanduri, Yuebin Guo, 2010 .

Multipurpose instrument calibration standard for particle beam, scanned probe and optical microscopy: NIST reference material (RM) 8820

Michael T. Postek, Benjamin Bunday, John Allgair, 2010, NanoScience + Engineering.

National Institute of Standards and Technology (NIST) J93 Project Proposal Report | NIST

Richard A. Allen, Michael T. Postek, James E. Potzick, 1994 .

Submicrometer Dimensional Metrology In The Scanning Electron Microscope

Michael T. Postek, 1987, Advanced Lithography.

Scanning electron microscope analog of scatterometry

Jeremiah R. Lowney, Michael T. Postek, John S. Villarrubia, 2002, SPIE Advanced Lithography.

Nanomanufacturing metrology for cellulosic nanomaterials: an update

Michael T. Postek, 2014, Optics & Photonics - NanoScience + Engineering.

High-accuracy critical-dimension metrology using a scanning electron microscope

Jeremiah R. Lowney, Michael T. Postek, Andras E. Vladar, 1996, Advanced Lithography.

Statistical models for estimating the measurement of pitch in metrology instruments

Michael T. Postek, Robert D. Larrabee, Nien F. Zhang, 1997 .

Documentation for Reference Material (RM) 8820: A Versatile, Multipurpose Dimensional Metrology Calibration Standard for Scanned Particle Beam, Scanned Probe and Optical Microscopy

Michael T. Postek, Bin Ming, Andras Vladar, 2014 .

Optimization of accurate SEM imaging by use of artificial images

Michael T. Postek, András E. Vladár, Petr Cizmar, 2009, Scanning Microscopies.

Fourier transform feedback tool for scanning electron microscopes used in semiconductor metrology

Michael T. Postek, Mark P. Davidson, András E. Vladár, 1997, Advanced Lithography.

Simulation study of repeatability and bias in the CD-SEM

Michael T. Postek, John S. Villarrubia, Andras E. Vladar, 2003, SPIE Advanced Lithography.

2nd Annual Tri-National Workshop on Standards for Nanotechnology - (NIST presentations) | NIST

Herbert S. Bennett, Ndubuisi G. Orji, Michael T. Postek, 2008 .

Design and Development of a Measurement and Control System for Measuring SEM Magnification Calibration Samples | NIST

Michael T. Postek, William J. Keery, Andras Vladar, 2002 .

DIGITAL IMAGING FOR SCANNING ELECTRON MICROSCOPY

Michael T. Postek, Andras Vladar, 2006 .

Recent progress in understanding the imaging and metrology using the helium ion microscope

Michael T. Postek, Andras E. Vladar, Bin Ming, 2009, Scanning Microscopies.

Accomplishments in nanotechnology

Michael T. Postek, Joseph J. Kopanski, D. A. Wollman, 2006 .

Application of the prototype NIST SRM 2090A SEM magnification standard in a manufacturing environment

Michael T. Postek, Brian L. Newell, Jan P. van der Ziel, 1995, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.

Accomplishments in Nanotechnology | NIST

Michael T. Postek, Joseph J. Kopanski, D. A. Wollman, 2006 .

Potentials of online scanning electron microscope performance analysis using NIST reference material 8091

Michael T. Postek, Nien-Fan Zhang, Robert D. Larrabee, 2000, Advanced Lithography.

Precision, accuracy, uncertainty and traceability and their application to submicrometer dimensional metrology

Michael T. Postek, Robert D. Larrabee, 1993 .

Advances in modeling of scanning charged-particle-microscopy images

Michael T. Postek, Andras E. Vladar, Petr Cizmar, 2010, Scanning Microscopies.

Technical Directions of the NIST Precision Engineering Division: 1997-2001 | NIST

Dennis A. Swyt, Michael T. Postek, Theodore V. Vorburger, 1998 .

Reference Material 8091: new scanning electron microscope sharpness standard

Michael T. Postek, Nien-Fan Zhang, Robert D. Larrabee, 2001, SPIE Advanced Lithography.

National Institute of Standards and Technology (NIST) J93 Project Interim Report

Michael T. Postek, James E. Potzick, Robert D. Larrabee, 1994 .

Does your SEM really tell the truth? Part 2

Michael T. Postek, András E. Vladár, Kavuri P. Purushotham, 2013, Defense, Security, and Sensing.

Introduction to special session on microscopy for Science, Technology, Engineering and Math (STEM) educators

Michael T. Postek, Robert Gordon, Bradley N. Damazo, 2012, Defense + Commercial Sensing.

Interim Report, NIST/SEMATECH Collaboration for Improvement of High-Accuracy Critical-Dimension Meetrology for Semiconductor Manufacturing | NIST

Michael T. Postek, 1997 .

Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences

Michael T. Postek, David C. Joy, Dale E. Newbury, 2011 .

Nanostructures and biology: some introductory remarks

Michael T. Postek, Martin C. Peckerar, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

Shape-Sensitive Linewidth Measurement with the SEM Using a Model-Based Library | NIST

Jeremiah R. Lowney, Michael T. Postek, John S. Villarrubia, 2001 .

Application of transmission electron detection to x-ray mask calibrations and inspection

Egon Marx, Michael T. Postek, Robert D. Larrabee, 1991, Other Conferences.

New Research in Nanotechnology - Nanotechnology Science and Technology Series | NIST

Michael T. Postek, Joseph J. Kopanski, D. A. Wollman, 2011 .

X-ray mask metrology: the development of linewidth standards for x-ray lithography

Egon Marx, Jeremiah R. Lowney, Michael T. Postek, 1993, Advanced Lithography.

Is your scanning electron microscope Hi‐Fi?

Michael T. Postek, András E. Vladár, Scott David Davilla, 2006 .

Active monitoring and control of electron-beam-induced contamination

Michael T. Postek, András E. Vladár, Ronald Vane, 2001, SPIE Advanced Lithography.

Performance of the prototype NIST SRM 2090A SEM magnification standard in a low-accelerating-voltage SEM

Michael T. Postek, Brian L. Newell, Jan P. van der Ziel, 1995, Advanced Lithography.

Edge determination for polycrystalline silicon lines on gate oxide

Jeremiah R. Lowney, Michael T. Postek, John S. Villarrubia, 2001, SPIE Advanced Lithography.

Integrated circuit metrology, inspection, and process control VI : 9-11 March 1992, San Jose, California

Michael T. Postek, 1992 .

NIST Accomplishments in Nanotechnology | NIST

Michael T. Postek, Joseph J. Kopanski, D. A. Wollman, 2006 .

Potentials of On-Line Scanning Electron Microscope Performance Analysis

Michael T. Postek, Nien-Fan Zhang, Andras Vladar, 2000 .

Metrology at the nanoscale: what are the grand challenges?

Michael T. Postek, Kevin W. Lyons, M. Postek, 2008, NanoScience + Engineering.

Notes from the nist/nrl/spie workshop on nanostructure science, metrology & technology: Microelectronics group

Michael T. Postek, Martin C. Peckerar, 2002 .

Is a production-level scanning electron microscope linewidth standard possible?

Michael T. Postek, John S. Villarrubia, Andras E. Vladar, 2000, Advanced Lithography.

Intercomparison of SEM, AFM, and electrical linewidths

Richard A. Allen, Jeremiah R. Lowney, Michael T. Postek, 1999, Advanced Lithography.

Scanning electron microscope dimensional metrology using a model‐based library

Michael T. Postek, John S. Villarrubia, András E. Vladár, 2005 .

Critical Dimension Measurement In The Scanning Electron Microscope

Michael T. Postek, 1984, Other Conferences.

Image sharpness measurement in scanning electron microscopy—part I

Michael T. Postek, Mark P. Davidson, Andrá E. Vladár, 2006 .

Linewidth measurement intercomparison on a BESOI sample

Richard A. Allen, Jeremiah R. Lowney, Michael T. Postek, 2000, Advanced Lithography.

New algorithm for the measurement of pitch in metrology instruments

Michael T. Postek, Nien-Fan Zhang, Robert D. Larrabee, 1996, Advanced Lithography.

SEM Sentinel - SEM Performance Measurement System, Part 1 | NIST

Michael T. Postek, M A. Donmez, Alice V. Ling, 2000 .

Photomask Dimensional Metrology in the SEM: Has Anything Really Changed?

Michael T. Postek, Marylyn Hoy Bennett, András E. Vladár, 2002, Photomask Technology.

Scanning Electron Microscope Length Standards (Chapter VII in: Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology, R.M. Silver, J.L. Land, Editors, NISTIR 6036) | NIST

Michael T. Postek, Joseph Fu, 1998 .

Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-um lithography

Charles N. Archie, Michael T. Postek, Andras E. Vladar, 2000, Advanced Lithography.

The challenge of nanometrology

Michael T. Postek, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

Nondestructive Submicron Dimensional Metrology Using the Scanning Electron Microscope

Michael T. Postek, 1987 .

Cellulose nanocrystals the next big nano-thing?

Michael T. Postek, Bin Ming, Andras Vladar, 2008, NanoScience + Engineering.

Telepresence: A New Paradigm for Solving Contamination Problems | NIST

Michael T. Postek, Marylyn Hoy Bennett, N J. Zaluzec, 1999 .

Step-height metrology for data storage applications

Michael T. Postek, Ronald G. Dixson, Theodore V. Vorburger, 1999, Optics & Photonics.

Toward traceability for at-line AFM dimensional metrology

Michael T. Postek, Theodore V. Vorburger, Ronald G. Dixson, 2002, SPIE Advanced Lithography.

A decade of commitment from the NIST Manufacturing Engineering Laboratory to nanomanufacturing and nanometrology

Michael T. Postek, Kevin W. Lyons, 2009, NanoScience + Engineering.

Radiation-induced synthesis and modification of soft nanomaterials for medical applications

Michael T. Postek, Mohamad Al-Sheikhly, Dianne L. Poster, 2018, NanoScience + Engineering.

Design and development of a measurement and control system for measuring SEM magnification calibration samples

Michael T. Postek, Andras E. Vladar, William J. Keery, 2002, SPIE Advanced Lithography.

Precision Engineering Division 2009 Program Technical Accomplishments | NIST

Michael T. Postek, 2010 .

Toward a unified advanced CD-SEM specification for sub-0.18-μm technology

Charles N. Archie, Michael T. Postek, Herschel M. Marchman, 1998, Advanced Lithography.

Material Standards for Environmental Health and Safety for Engineered Nanoscale Materials

Michael T. Postek, John A. Small, Dianne L. Poster, 2007 .

SEM sentinel-SEM performance measurement system

Michael T. Postek, Andras E. Vladar, Alice V. Ling, 2001, SPIE Advanced Lithography.

Report out of the military sciences working group

Michael T. Postek, Martin C. Peckerar, M. Peckerar, 2002 .

Parameters characterizing the measurement of a critical dimension

Michael T. Postek, Robert D. Larrabee, 1994, Advanced Lithography.

Telepresence: a new paradigm for industrial and scientific collaboration

Michael T. Postek, Marylyn Hoy Bennett, Nestor J. Zaluzec, 1999, Advanced Lithography.

Metrological Electron Microscope for the Certification of Magnification and Linewidth Artifacts for the Semiconductor Industry

Michael T. Postek, William J. Keery, Samuel N. Jones, 1989, Advanced Lithography.

Metrology break-out group

Michael T. Postek, Martin C. Peckerar, 2002 .

Ultra-low landing energy scanning electron microscopy for nanoengineering applications and metrology

Michael T. Postek, András E. Vladár, Dianne L. Poster, 2020, NanoScience + Engineering.

Laser sample stage-based image resolution enhancement method for SEMs

Michael T. Postek, András E. Vladár, William J. Keery, 2004, SPIE Advanced Lithography.

Scanning electron microscope metrology

Michael T. Postek, M. Postek, 1994, Advanced Lithography.

Report on the NIST low-accelerating-voltage SEM magnification standard interlaboratory study

Michael T. Postek, Andras E. Vladar, William J. Keery, 1993, Advanced Lithography.

New method for the measurement of SEM stage vibrations

Michael T. Postek, Andras E. Vladar, William J. Keery, 2004, SPIE Advanced Lithography.

Instrumentation, Metrology, and Standards, Three Keys to the Nanotech Kingdom | NIST

Michael T. Postek, Kevin W. Lyons, 2009 .

INEXPENSIVE DIGITAL IMAGING

Michael T. Postek, András E. Vladár, 2006 .

Nanometer-scale metrology: meeting the nanotechnology measurement challenges

Michael T. Postek, M. Postek, 2002, Workshop on Nanostructure Science, Metrology, and Technology.

Nanomanufacturing concerns about measurements made in the SEM part IV: charging and its mitigation

Michael T. Postek, András E. Vladár, A. Vladár, 2015, SPIE NanoScience + Engineering.

Fourier Transform Feedback for Scanning Electron Microscopes Used in Semiconductor Metrology | NIST

Michael T. Postek, Mark P. Davidson, Andras Vladar, 1997 .

Benchmarking the Length Measurement Capabilities of the National Institute of Standards and Technology | NIST

Michael T. Postek, James E. Potzick, Ronald G. Dixson, 1998 .

Strategies for nanoscale contour metrology using critical dimension atomic force microscopy

Ndubuisi G. Orji, Michael T. Postek, Ronald G. Dixson, 2011, NanoScience + Engineering.

Reference material (RM) 8820: a versatile new NIST standard for nanometrology

Michael T. Postek, Benjamin Bunday, Andras E. Vladar, 2010, Advanced Lithography.

Dimensional metrology at the nanometer level: combined SEM and PPM

Michael T. Postek, Huddee J. Ho, Harrison L. Weese, 1997, Advanced Lithography.

Critical Dimension and Overlay Metrology | NIST

Michael T. Postek, Marylyn Hoy Bennett, 2003 .

Instrumentation, metrology, and standards: key elements for the future of nanomanufacturing

Michael T. Postek, Kevin W. Lyons, M. Postek, 2007, SPIE NanoScience + Engineering.

The NIST Advanced Measurement Laboratory: at the leading edge of measurement science and technology

Michael T. Postek, John R. Stoup, John Lawall, 2006, SPIE Optics + Photonics.

Optimizing optical precision of an image using curved focal plane technology

Michael T. Postek, Dianne L. Poster, Sujay Swain, 2021, OPTO.

Ultraviolet Radiation Technologies and Healthcare-Associated Infections: Standards and Metrology Needs

Michael T. Postek, Yaw S. Obeng, Dianne L. Poster, 2021, Journal of research of the National Institute of Standards and Technology.

Exploring and Extending the Limits of CD-SEMs' Resolution | NIST

Michael T. Postek, John S. Villarrubia, Andras Vladar, 2003 .

10 nm Three-Dimensional CD-SEM Metrology | NIST

Michael T. Postek, John S. Villarrubia, András E. Vladár, 2014 .

Nanoscale reference materials for environmental, health and safety measurements: needs, gaps and opportunities

Michael T. Postek, Gert Roebben, Vincent A. Hackley, 2012, Nanotoxicology.

Development of the metrology and imaging of cellulose nanocrystals

Michael T. Postek, András E. Vladár, Arvind Raman, 2011 .

Report of Investigation: Reference Material 8090 - SEM Magnification Calibration Reference Material | NIST

Michael T. Postek, R Gettings, 1995 .

Photomask dimensional metrology in the scanning electron microscope, part II: High-pressure/environmental scanning electron microscope

Michael T. Postek, Andra´s E. Vlada´r, Marylyn Hoy Bennett, 2004 .

Comparison of Electron Imaging Modes for Dimensional Measurements in the Scanning Electron Microscope †

Michael T. Postek, John S. Villarrubia, András E. Vladár, 2016, Microscopy and Microanalysis.

Statistical Measure for the Sharpness of the SEM Image | NIST

Michael T. Postek, Robert D. Larrabee, Nien F. Zhang, 1997 .

Benchmarking of Advanced CD-SEMs Against the New Unified Specification for Sub-0.18 Micrometer Lithography | NIST

Charles N. Archie, Michael T. Postek, John A. Allgair, 2000 .

Microlithography and Metrology in Micromachining III

Michael T. Postek, Craig R. Friedrich, 1995 .

A Kurtosis-Based Statistical Measure for Two-Dimensional Processes and Its Applications to Image Sharpness

Michael T. Postek, Robert D. Larrabee, András E. Vladár, 2003 .

Modification of a commercial SEM with a computer controlled cathode stabilized power supply

Michael T. Postek, William J. Keery, Andras Vladar, 1993 .

Specimen biasing to enhance or suppress secondary electron emission from charging specimens at low accelerating voltages

Michael T. Postek, Robert D. Larrabee, William J. Keery, 1989 .

Low Accelerating Voltage SEM Magnification Standard Prototype

R. C. Tiberio, Michael T. Postek, 1988 .

Helium Ion Microscopy: a New Technique for Semiconductor Metrology and Nanotechnology

Michael T. Postek, András E. Vladár, John A. Kramar, 2007 .

Modification of hydrogen-passivated silicon by a scanning tunneling microscope operating in air

Michael T. Postek, J. Schneir, Christopher J. Evans, 1990 .

On the Sub-Nanometer Resolution of Scanning Electron and Helium Ion Microscopes

Michael T. Postek, András E. Vladár, Bin Ming, 2009, Microscopy Today.

Review of current progress in nanometrology with the helium ion microscope

Charles N. Archie, Michael T. Postek, András E. Vladár, 2011 .

National Nanotechnology Initiative Interagency Workshop on Instrumentation and Metrology for Nanotechnology Grand Challenge Report | NIST

Michael T. Postek, Richard R. Cavanagh, Richard M. Silver, 2006 .

Integrated Circuit Metrology, Inspection, And Process Control VII

Michael T. Postek, 1993 .

Workshop Report 3: Edge Positions From Scanning Electron Microscope Signals by Comparing Models With Measure | NIST

Jeremiah R. Lowney, Michael T. Postek, Andras Vladar, 1995 .

Real-Time Image Composition with Correction of Drift Distortion

Michael T. Postek, András E. Vladár, Petr Cizmar, 2009 .

Helium ion microscopy and its application to nanotechnology and nanometrology

Michael T. Postek, András E. Vladár, A. Vladár, 2008 .

Application of High Pressure/Environmental Scanning Electron Microscopy to Photomask Dimensional Metrology

Michael T. Postek, András E. Vladár, 2003 .

Parameters Characterizing a Critical Dimension Measurement | NIST

Michael T. Postek, Robert D. Larrabee, 1994 .

Scanning Electron Microscope Linewidth Measurement Standards Programat the National Bureau of Standards | NIST

Michael T. Postek, Robert D. Larrabee, William J. Keery, 1987 .

Workshop Report 1: Scanning Electron Microscope Metrology as Related to a Defined Edge Structure

Michael T. Postek, Andras Vladar, A. Vladár, 1995 .

Scanning Electron Microscope-Based Metrological Electron Microscope System and New Prototype SEM Magnification Standard

Michael T. Postek, M. Postek, 1989 .

A Simulation Study of Repeatability and Bias in the CD-SEM | NIST

Michael T. Postek, John S. Villarrubia, András E. Vladár, 2003 .

Sample preparation protocols for realization of reproducible characterization of single-wall carbon nanotubes

Michael T. Postek, Rolf Zeisler, Lu Yang, 2009 .

The Helium Ion Microscope: A New Tool for Nanotechnology and Nanomanufacturing | NIST

Michael T. Postek, John A. Kramar, Andras Vladar, 2007 .

3 – MICROLITHOGRAPHY METROLOGY

Michael T. Postek, Robert D. Larrabee, Loren W. Linholm, 1991 .

Spectral density-based statistical measures for image sharpness

Michael T. Postek, Nien Fan Zhang, Robert D. Larrabee, 2005 .

Experimental test of blind tip reconstruction for scanning probe microscopy

Michael T. Postek, John S. Villarrubia, Thomas B. Renegar, 2000 .

Fabrication Issues for the Prototype NIST SRM 2090A SEM Magnification Calibration Standard | NIST

Michael T. Postek, Brian L. Newell, J VanDerZiel, 1995 .

Inverse Electron Beam Modeling and Metrology Research | NIST

Jeremiah R. Lowney, Michael T. Postek, Robert D. Larrabee, 1998 .

The Scanning Electron Microscope

Michael T. Postek, András E. Vladár, 2017 .

An approach to the reduction of hydrocarbon contamination in the scanning electron microscope

Michael T. Postek, M. Postek, 2006 .

Submicrometer Microelectronics Dimensional Metrology: Scanning Electron Microscopy

Michael T. Postek, David C. Joy, D. Joy, 1987, Journal of Research of the National Bureau of Standards.

Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version) | NIST

Charles N. Archie, Michael T. Postek, Bhanwar Singh, 2000 .

Electron Beam-Induced Sample Contamination in the SEM

Michael T. Postek, András E. Vladár, A. Vladár, 2005, Microscopy and Microanalysis.

Low Accelerating Voltage Pitch Standard Based on the Modification of NBS SRM 484

Michael T. Postek, 1987 .

Microelectronics Dimensional Metrology in the Scanning Electron Microscope, Part II

Michael T. Postek, David C. Joy, 1986 .