Takashi Matsunaga

发表

ICONE23-1896 DEVELOPMENT OF CHECK VALVE INSPECTION SYSTEM

Takashi Matsunaga, Junji Etoh, S. Inagawa, 2015 .

Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography

Satoshi Tanaka, Hiroaki Taniguchi, Takashi Matsunaga, 2001, SPIE Advanced Lithography.

Development of high-power ArF/F2 laser platform for VUV microlithography

Tatsuya Ariga, Hakaru Mizoguchi, Akira Sumitani, 2004, SPIE Advanced Lithography.

Application Examples of Electromagnetic Field Analysis at Fujitsu

Takashi Matsunaga, Hideki Maeda, Toshiro Sato, 2012 .

193nm high power lasers for the wide bandgap material processing

Junichi Fujimoto, Hiroaki Oizumi, Takashi Matsunaga, 2017, LASE.

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Satoshi Tanaka, Takahito Kumazaki, Junichi Fujimoto, 2009, Advanced Lithography.

Ultra line narrowed injection lock laser light source for higher NA ArF immersion lithography tool

Shinji Nagai, Satoshi Tanaka, Toru Suzuki, 2007, SPIE Advanced Lithography.

The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation

Takahito Kumazaki, Takashi Matsunaga, Hakaru Mizoguchi, 2016, Advanced Lithography.

Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography

Satoshi Tanaka, Junichi Fujimoto, Hiroaki Nakarai, 2007, SPIE Advanced Lithography.

Will conventional E95% spectral indicator last forever? (Conference Presentation)

Toshihiro Oga, Takashi Matsunaga, Kenji Takahisa, 2017, Advanced Lithography.

A reliable higher power ArF laser with advanced functionality for immersion lithography

Takahito Kumazaki, Junichi Fujimoto, Shinji Okazaki, 2012, Advanced Lithography.

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

Takahito Kumazaki, Keisuke Ishida, Takashi Matsunaga, 2016, Advanced Lithography.

The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes

Takahito Kumazaki, Takashi Matsunaga, Hakaru Mizoguchi, 2017, Advanced Lithography.

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

Takahito Kumazaki, Keisuke Ishida, Takashi Matsunaga, 2015, Advanced Lithography.

ICONE23-1644 APPLICATION OF DR. MAINTE, INTEGRATED SIMULATOR OF MAINTENANCE OPTIMIZATION, TO LWRS

Satoshi Matsumoto, Shinobu Yoshimura, Yoshihiro Isobe, 2015 .

ICONE23-1900 DEVELOPMENT OF NON-DESTRUCTIVE INSPECTION TECHNIQUE FOR WEDGE ANCHOR BOLTS USING AE SENSOR

Takashi Matsunaga, Junji Etoh, Yoshihiro Isobe, 2015 .

Extremely high-NA high-throughput-scanner-compatible 4-kHz KrF excimer laser for DUV lithography

Satoshi Tanaka, Hiroaki Nakarai, Tatsuo Enami, 2000, SPIE Advanced Lithography.

Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography

Takahito Kumazaki, Takeshi Asayama, Takashi Matsunaga, 2013, Advanced Lithography.

High-power and high-energy stability injection lock laser light source for double exposure or double patterning ArF immersion lithography

Shinji Nagai, Satoshi Tanaka, Junichi Fujimoto, 2008, SPIE Advanced Lithography.

Flexible and reliable high power injection locked laser for double exposure and double patterning ArF immersion lithography

Satoshi Tanaka, Junichi Fujimoto, Takashi Matsunaga, 2010, Advanced Lithography.

Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography

Takahito Kumazaki, Takeshi Asayama, Takashi Matsunaga, 2014, Advanced Lithography.

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Satoshi Tanaka, Junichi Fujimoto, 2008, SPIE Advanced Lithography.

GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Shinji Nagai, Hakaru Mizoguchi, Satoshi Tanaka, 2006, SPIE Advanced Lithography.

Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography

Takahito Kumazaki, Keisuke Ishida, Takashi Matsunaga, 2015, Advanced Lithography.

Ultra line-narrowed ArF excimer laser G42A for sub-90-nm lithography generation

Hakaru Mizoguchi, Akira Sumitani, Junichi Fujimoto, 2003, SPIE Advanced Lithography.

Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography

Takahito Kumazaki, Takashi Matsunaga, Hakaru Mizoguchi, 2017, Advanced Lithography.

Excimer laser gas usage reduction technology for semiconductor manufacturing

Takashi Matsunaga, Hakaru Mizoguchi, Hiroaki Tsushima, 2017, Advanced Lithography.

Optical performance of laser light source for ArF immersion double patterning lithography tool

Satoshi Tanaka, Takahito Kumazaki, Junichi Fujimoto, 2009, Advanced Lithography.

Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography

Tatsuo Enami, Hitoshi Tomaru, Takashi Matsunaga, 2001, SPIE Advanced Lithography.

Ecology and high-durability injection locked laser with flexible power for double-patterning ArF immersion lithography

Satoshi Tanaka, Hiroshi Tanaka, Junichi Fujimoto, 2011, Advanced Lithography.

High power DUV lasers for material processing

Hakaru Mizoguchi, Junichi Fujimoto, Hiroaki Oizumi, 2016, SPIE/COS Photonics Asia.

Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes

Masato Moriya, Takahito Kumazaki, Keisuke Ishida, 2014, Advanced Lithography.

Ultra-high-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography

Takashi Matsunaga, Tatsushi Igarashi, Yoichi Sasaki, 2001 .

Enhancement of Dry-Etching Durabilities by Energy or Etchant Quenching

Kenji Murata, Takashi Matsunaga, Hiroaki Kawata, 1999 .

Advanced excimer laser technologies enable green semiconductor manufacturing

Takashi Matsunaga, Hakaru Mizoguchi, Kouji Kakizaki, 2017 .

P-77: Novel and Highly Reliable XeF and KrF Excimer Laser Annealing for Reducing the Cost of Flat Panel Display Equipment

Akiyoshi Suzuki, Junichi Fujimoto, Takashi Matsunaga, 2017 .

Soft Magnetic Properties of bcc Fe–Au–X–Si–B (X=Early Transition Metal) Alloys with Fine Grain Structure

Takashi Matsunaga, Akihisa Inoue, Tsuyoshi Masumoto, 1989 .

Long-Pulse-Discharge XeF and KrF Lasers Pumped by a Generator with Inductive Energy Storage

Alexei N. Panchenko, Victor F. Tarasenko, E. H. Baksht, 2002 .

A simulation model of ultrasonic wave changes due to irradiation-induced microstructural evolution of thick 304 stainless steel blocks

Mitsuyuki Sagisaka, Takashi Matsunaga, Junji Etoh, 2013 .

Development of a nondestructive inspection method for irradiation-induced microstructural evolution of thick 304 stainless steel blocks

Mitsuyuki Sagisaka, Takashi Matsunaga, Junji Etoh, 2013 .

A sub-Watt, line-narrowing, 193-nm solid state laser operating at 6 kHz with KBBF for injection-locking ArF excimer laser systems

Junichi Fujimoto, Shinji Ito, Takashi Matsunaga, 2012 .

Amplification of DUV solid-state laser pulse using ArF laser

Taisuke Miura, Takashi Matsunaga, Yoichi Sasaki, 2017, 2017 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC).