David S. Alles

Reticle inspection system using DUV wavelength and new alogorithm platform for advanced reticle inspection for 0.13-μm technology node

James N. Wiley, David S. Alles, Paul Terbeek, 2000, Photomask Japan.

Results from a new die-to-database reticle inspection platform

Larry S. Zurbrick, Chris A. Mack, James N. Wiley, 2004, Photomask Japan.

Measuring line-edge roughness of masks with DUV light

David S. Alles, Stan Stokowski, 2005, SPIE Photomask Technology.

Results from a new 193nm die-to-database reticle inspection platform

David S. Alles, William H. Broadbent, Yalin Xiong, 2010, Photomask Japan.