Kangmin Hsia

Reticle inspection system using DUV wavelength and new alogorithm platform for advanced reticle inspection for 0.13-μm technology node

James N. Wiley, David S. Alles, Paul Terbeek, 2000, Photomask Japan.

EUV mask process development and integration

Yan Du, Pei-Yang Yan, Jeff Farnsworth, 2006, Photomask Japan.

Laser pulse self-focusing

Kangmin Hsia, C. D. Cantrell, 1991 .

EUV mask pilot line at Intel Corporation

Pei-Yang Yan, Edita Tejnil, Emily Y. Shu, 2004, SPIE Photomask Technology.

An energy-efficient free-space optical interconnection for clock distribution

Kangmin Hsia, Lakshman S. Tamil, L. Tamil, 1995 .