Peter Hudek
发表
Dirk Beyer,
Ute Buttgereit,
Mathias Irmscher,
2002,
Photomask Technology.
Dirk Beyer,
William J. Dauksher,
Kevin J. Nordquist,
2004,
European Mask and Lithography Conference.
Dirk Beyer,
Martin Tschinkl,
Joerg Butschke,
2003,
Photomask Japan.
Dirk Beyer,
Joerg Butschke,
Mathias Irmscher,
2003,
SPIE Photomask Technology.
Dirk Beyer,
Mitsuru Sato,
Joerg Butschke,
2004,
Photomask Japan.
Peter Hudek,
Ivo W. Rangelow,
Ivan Kostic,
1996,
Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.
Gabriel Vanko,
Peter Hudek,
Johann Zehetner,
2013,
Microtechnologies for the New Millennium.
Mask patterning using chemically amplified resists and the novel STEAG HamaTech Blank Coater ASR5000
Dirk Beyer,
Mathias Irmscher,
Corinna Koepernik,
2002,
Photomask Technology.
Elmar Platzgummer,
Ingo Bork,
Peter Buck,
2018,
Photomask Technology.
Dirk Beyer,
Peter Hudek,
Chung-Hsing Chang,
2005,
SPIE/COS Photonics Asia.
Michael Green,
Henry Kamberian,
Jeff McMurran,
2016,
European Mask and Lithography Conference.
Klaus-Dieter Roeth,
Frank Laske,
Mehdi Daneshpanah,
2015,
Other Conferences.
Dirk Beyer,
Peter Hudek,
Thomas Elster,
2002,
SPIE Photomask Technology.
Michael Green,
Henry Kamberian,
Bryan S. Kasprowicz,
2016,
Photomask Technology.
Masahiro Hashimoto,
Toshiya Takahashi,
Peter Hudek,
2021,
Journal of Micro/Nanopatterning, Materials, and Metrology.
William J. Dauksher,
Kevin J. Nordquist,
Douglas J. Resnick,
2004
.