Aki Fujimura

发表

Correction of resist heating effect on variable shaped beam mask writer

Haruyuki Nomura, Takashi Kamikubo, Mizuna Suganuma, 2016 .

Fast all-angle Mask 3D for ILT patterning

Aki Fujimura, Ryan Pearman, Mike Meyer, 2020 .

Mask CD relationship to temperature at the time backscatter is received

Takashi Kamikubo, Noriaki Nakayamada, Yukihiro Masuda, 2017, Photomask Japan.

Model-based mask data preparation (MB-MDP) for ArF and EUV mask process correction

Ingo Bork, Aki Fujimura, Kazuyuki Hagiwara, 2011, Photomask Japan.

eBeam initiative survey reports confidence in EUV and multi-beam technology

Aki Fujimura, Jan Willis, 2017, Photomask Japan.

A deep learning mask analysis toolset using mask SEM digital twins

Jun Yashima, Noriaki Nakayamada, Mikael Wahlsten, 2020, Photomask Technology.

Full-chip GPU-accelerated curvilinear EUV dose and shape correction

Aki Fujimura, Ryan Pearman, Bo Su, 2017, Photomask Technology.

GPU-accelerated inline linearity correction: pixel-level dose correction (PLDC) for the MBM-1000

Noriaki Nakayamada, Yukihiro Masuda, Aki Fujimura, 2017, Photomask Japan.

Trends in mask data preparation

Bo Su, Aki Fujimura, Yohan Choi, 2014, Photomask Technology.

Study of mask and wafer co-design that utilizes a new extreme SIMD approach to computing in memory manufacturing: full-chip curvilinear ILT in a day

Bo Su, Aki Fujimura, Linyong Pang, 2019, Photomask Technology.

2020 mask maker survey conducted by the eBeam initiative

Aki Fujimura, Jan Willis, 2020, Photomask Technology.

Making digital twins using the Deep Learning Kit (DLK)

Thang Nguyen, Aki Fujimura, Linyong Pang, 2019, Photomask Technology.

Writing wavy metal 1 shapes on 22-nm logic wafers with less shot count

Tadashi Komagata, John S. Petersen, Yasutoshi Nakagawa, 2010, Photomask Japan.

How utilizing curvilinear design enables better manufacturing process window

Aki Fujimura, Ryan Pearman, P. Jeffrey Ungar, 2020 .

How GPU-accelerated simulation enables applied deep learning for masks and wafers

Aki Fujimura, Linyong Pang, Ryan Pearman, 2019, Photomask Japan.

Quality and EDA

Aki Fujimura, 2005, ISQED.

Best depth of focus on 22-nm logic wafers with less shot count

David Kim, Vikram Tolani, Tadashi Komagata, 2010, Photomask Japan.

Adopting curvilinear shapes for production ILT: challenges and opportunities

Aki Fujimura, Ryan Pearman, Leo Pang, 2019, Photomask Technology.

Quality on Time

Aki Fujimura, Frances Moore, 2004, Software Quality Journal.

eBeam initiative surveys report greatly increased confidence in EUV and mask process correction requirements

Aki Fujimura, Jan Willis, 2018, Photomask Japan.

Model-based MPC enables curvilinear ILT using either VSB or multi-beam mask writers

Daisuke Hara, Bo Su, Linyong Pang, 2017, Photomask Japan.

2017 mask maker survey conducted by the eBeam Initiative

Aki Fujimura, Jan Willis, 2017, Photomask Technology.

Improvement of mask write time for curvilinear assist features at 22nm

Daisuke Hara, Tadashi Komagata, Ingo Bork, 2010, Photomask Technology.

Enabling faster VSB writing of 193i curvilinear ILT masks that improve wafer process windows for advanced memory applications

Yang Lu, Bo Su, Aki Fujimura, 2020, Photomask Technology.

2019 Mask makers' survey conducted by the eBeam Initiative

Aki Fujimura, Jan Willis, 2019, Photomask Technology.

EUV modeling in the multi-beam mask writing era

Harold R. Zable, Aki Fujimura, Ryan Pearman, 2017, Photomask Japan.

How curvilinear mask patterning will enhance the EUV process window: a study using rigorous wafer+mask dual simulation

Aki Fujimura, Ryan Pearman, Nagesh Shirali, 2019, Photomask Japan.

2018 mask makers’ survey conducted by the eBeam Initiative

Aki Fujimura, Jan Willis, 2017, Photomask Technology.

Five deep learning recipes for the mask-making industry

Noriaki Nakayamada, Thang Nguyen, Aki Fujimura, 2019, Photomask Technology.

eBeam community speaks out on future directions for photomask manufacturing

Aki Fujimura, Jan Willis, 2016, Photomask Japan.

Model-based mask data preparation (MB-MDP) and its impact on resist heating

Takashi Kamikubo, Ingo Bork, Aki Fujimura, 2011, Advanced Lithography.

Optimization of mask shot count using MB-MDP and lithography simulation

Yi Zou, Cyrus E. Tabery, Ingo Bork, 2011, Photomask Technology.

Writing 32nm-hp contacts with curvilinear assist features

Christophe Pierrat, David Kim, Aki Fujimura, 2010, Photomask Technology.

Quality on Time

Aki Fujimura, 1998, ISQED.

X Architecture Place and Route

Joseph L. Ganley, Jon Frankle, Aki Fujimura, 2008, Handbook of Algorithms for Physical Design Automation.

TrueMask ILT MWCO: full-chip curvilinear ILT in a day and full mask multi-beam and VSB writing in 12 hrs for 193i

Bo Su, Linyong Pang, Aki Fujimura, 2020 .

Design for e-beam: design insights for direct-write maskless lithography

Aki Fujimura, 2010, Photomask Technology.

Efficiently writing circular contacts on production reticle

Christophe Pierrat, Tadashi Komagata, Yasutoshi Nakagawa, 2010, Photomask Japan.

eBeam initiative surveys report upbeat photomask market outlook

Aki Fujimura, Jan Willis, 2021, Photomask Japan.

An SEM-based deep defect classification system for VSB mask writer that works with die-to-die and die-to-database inspection methods using multiple digital twins built with the state-of-the-art neural networks

Noriaki Nakayamada, Aki Fujimura, Suhas Pillai, 2021, Photomask Technology 2021.

Breakthrough curvilinear ILT enabled by multi-beam mask writing

Bo Su, Aki Fujimura, Ryan Pearman, 2021, Journal of Micro/Nanopatterning, Materials, and Metrology.

A deep learning toolset to mask analysis with SEM digital twins

Noriaki Nakayamada, Mikael Wahlsten, Aki Fujimura, 2021, Photomask Japan.

Curvilinear masks: an overview

Aki Fujimura, Abhishek Shendre, Yohan Choi, 2021, Photomask Technology.

A general formula for deep learning success in semiconductor manufacturing

Aki Fujimura, Ajay Baranwal, 2021, Photomask Technology 2021.