B. Bunday

发表

CD-SEM measurement line-edge roughness test patterns for 193-nm lithography

John S. Villarrubia, Andras E. Vladar, Michael Bishop, 2003, SPIE Advanced Lithography.

Linewidth Roughness and Cross-sectional Measurements of Sub-50 nm Structures Using CD-SAXS and CD-SEM

J. Villarrubia, D. Ho, B. Bunday, 2008, 2008 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.

TEM calibration methods for critical dimension standards

Ndubuisi G. Orji, Richard A. Allen, Michael W. Cresswell, 2007, SPIE Advanced Lithography.

Measurement of high-k and metal film thickness on FinFET sidewalls using scatterometry

Benjamin Bunday, Thaddeus Gerard Dziura, Xiafang Zhang, 2008, SPIE Advanced Lithography.

Low temperature ZEP-520A development process for enhanced critical dimension realization in reactive ion etch etched polysilicon

B. Bunday, T. Eschrich, G. M. Laws, 2007 .

Development of transmon qubits solely from optical lithography on 300 mm wafers

E. Holland, S. Novak, P. Kearney, 2019, Quantum Science and Technology.

Simulating process subtleties in SEM imaging

B. Bunday, Y. Yamazaki, Shari Klotzkin, 2022, Advanced Lithography.

Metrology for the next generation of semiconductor devices

M. Badaroglu, Y. Obeng, N. G. Orji, 2018, Nature Electronics.

Nondestructive shape process monitoring of three-dimensional, high-aspect-ratio targets using through-focus scanning optical microscopy

Ravi Kiran Attota, Benjamin Bunday, Richard Allen, 2018, Measurement science & technology.

Feasibility study on 3-D shape analysis of high-aspect-ratio features using through-focus scanning optical microscopy.

Ravi Kiran Attota, Peter Weck, John A Kramar, 2016, Optics express.

Improving optical measurement accuracy using multi-technique nested uncertainties

Hui Zhou, Bryan M. Barnes, Ronald G. Dixson, 2009, Advanced Lithography.

Determination of optimal parameters for CD-SEM measurement of line-edge roughness

John S. Villarrubia, Theodore V. Vorburger, Andras E. Vladar, 2004, SPIE Advanced Lithography.

In-line E-beam metrology and defect inspection: industry reflections, hybrid E-beam opportunities, recommendations and predictions

Alok Vaid, Oliver D. Patterson, Benjamin D. Bunday, 2017, Advanced Lithography.

In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection

Alok Vaid, Benjamin Bunday, Oliver D. Patterson, 2013, Advanced Lithography.

Parallel MEMS AFM for high-throughput semiconductor metrology and inspection

B. Bunday, Zhenle Cao, Wyatt Sullivan, 2023, Advanced Lithography.

Developing an uncertainty analysis for optical scatterometry

Heather Patrick, Richard M. Silver, Benjamin Bunday, 2009, Advanced Lithography.

Fundamental limits of optical critical dimension metrology: a simulation study

Egon Marx, Bryan M. Barnes, Benjamin Bunday, 2007, SPIE Advanced Lithography.

Monitoring measurement tools: new methods for driving continuous improvements in fleet measurement uncertainty

Carsten Hartig, Alok Vaid, Bernd Schulz, 2009, Advanced Lithography.

Metrology for the next generation of semiconductor devices

R. J. Kline, Y. Obeng, U. Celano, 2018, Nature Electronics.

Critical dimension small angle X-ray scattering measurements of FinFET and 3D memory structures

Wen-li Wu, Benjamin Bunday, Chengqing Wang, 2013, Advanced Lithography.

Metrology capabilities and needs for 7nm and 5nm logic nodes

Alok Vaid, Benjamin D. Bunday, Eric Solecky, 2017, Advanced Lithography.

HVM metrology challenges towards the 5nm node

Benjamin Bunday, B. Bunday, 2016, SPIE Advanced Lithography.

CD-SEM algorithm optimization for line roughness metrology (Conference Presentation)

Chris A. Mack, Benjamin D. Bunday, C. Mack, 2018 .

X-ray scattering critical dimensional metrology using a compact x-ray source for next generation semiconductor devices

Benjamin Bunday, R. Joseph Kline, Daniel F. Sunday, 2017 .

Accuracy considerations for critical dimension semiconductor metrology

Ndubuisi G. Orji, Ronald G. Dixson, Benjamin Bunday, 2008, NanoScience + Engineering.

7/5nm logic manufacturing capabilities and requirements of metrology

Alok Vaid, Benjamin Bunday, Eric Solecky, 2018, Advanced Lithography.

X-ray reflectometry and x-ray fluorescence monitoring of the atomic layer deposition process for high-k gate dielectrics

H. Yeung, P. Hung, B. Bunday, 2005 .

CD-SEM metrology for sub-10nm width features

Aaron Cordes, Benjamin Bunday, Aron Cepler, 2014, Advanced Lithography.

Applications of image diagnostics to metrology quality assurance and process control

Alexander Starikov, James E. Potzick, Mark P. Davidson, 2003, SPIE Advanced Lithography.