M. Ameen

M. Ameen, W. Krull, M. Mack, 2000, 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432).

Molecular carbon implant technology for ultra-shallow junction formation and n-MOSFET strain application in a 40nm node logic device

M. Ameen, D. Tieger, J. Shiu, 2009, 2009 International Workshop on Junction Technology.

Development of an automated dual ion beam assisted process for superconducting oxide film deposition

A. Kingon, A. Krauss, O. Auciello, 1991 .

Computer-controlled ion beam deposition systems for high Tc superconductor and other multi-component oxide thin films and layered structures

A. Kingon, D. Gruen, A. Krauss, 1990 .

Bottom electrodes for integrated Pb(Zr, Ti)O3 films

A. Kingon, O. Auciello, M. Ameen, 1992 .

Ion Beam Sputter Deposition Of Ferroelectric Oxide Thin Films

A. Kingon, O. Auciello, M. Ameen, 1991 .

Surface Chemistry of Dry Etching Processes

M. Ameen, T. Mayer, D. Vitkavage, 1988 .

Surface segregation during reactive etching of GaAs and InP

M. Ameen, T. Mayer, 1986 .

Tunable work function molybdenum gate technology for FDSOI-CMOS

Tsu-Jae King, A. Agarwal, Daewon Ha, 2002, Digest. International Electron Devices Meeting,.

Modulated ion beam studies of product formation and ejection in ion‐induced etching of GaAs by Cl2

M. Ameen, T. Mayer, 1988 .

A critical analysis of techniques and basic phenomena related to deposition of high temperature superconducting thin films

A. Kingon, A. Krauss, O. Auciello, 1990 .

Silicon damage control through the use of aromatic hydrocarbon ion implantation

M. Ameen, Daeho Yoon, Kyung-Won Lee, 2020 .

Processing issues in Silicon nanocrystal manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications

Panagiotis Dimitrakis, Pascal Normand, A. Agarwal, 2004 .

Nanocrystals manufacturing by ultra-low-energy ion-beam-synthesis for non-volatile memory applications

M. Perego, M. Fanciulli, N. Cherkashin, 2004 .

Cost-Effective Low $V_{t}$ Ni-FUSI CMOS on SiON by Means of Al Implant (pMOS) and $\hbox{Yb}{+}\hbox{P}$ Coimplant (nMOS)

A. Veloso, J. Kittl, A. Lauwers, 2008, IEEE Electron Device Letters.

High Resolution Imaging of Twin and Antiphase Domain Boundaries in Perovskite KNbO3 Thin Films.

A. Kingon, J. Hren, O. Auciello, 1990 .

Charging effects on medium current implanter on CMOS and mixed signal IC's

T. Gandy, M. Ameen, A. Singh, 2002, Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on.

Studies on Ion Scattering and Sputtering Processes Relevant to Ion Beam Sputter Deposition of Multicomponent Thin Films

A. Kingon, A. Krauss, O. Auciello, 1989 .

Characterization of KNbO 3 Thin Films Deposited by Ion Beam Sputtering using a Computer-Controlled Rotating Target Holder

A. Kingon, A. Krauss, O. Auciello, 1989 .

Processing-structure relations for ferroelectric thin films deposited by ion beam sputter deposition

A. Kingon, O. Auciello, M. Ameen, 1991 .

Measurement of the strain in strained-Si/Si0.79Ge0.21 with HRBS/channeling

H. Gossmann, M. Ameen, Motofumi Suzuki, 2006 .

High Mass Molecular Ion Implantation

M. Ameen, B. Chang, 2011 .

Silicon nanocrystal memory devices obtained by ultra-low-energy ion-beam synthesis

M. Perego, M. Fanciulli, A. Claverie, 2004 .

Effects of resist strip and clean on USJ performance

M. Ameen, I. Berry, S. Luo, 2008, Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08).

Controlled ion beam sputter deposition of W/Cu/W layered films for microelectronic applications

O. Auciello, M. Ameen, S. Chevacharoenkul, 1991 .