J. Hillman

Electrical properties of Ti/TiN films prepared by chemical vapor deposition and their applications in submicron structures as contact and barrier materials

J. Hu, M. Ameen, G. Leusink, 1997 .

Texture and surface roughness of PRCVD aluminum films

T. Cale, J. Hillman, B. Rogers, 1998 .

Some effects of temperature ramping on metal organic chemical vapor deposited Al film nucleation

T. Cale, J. Hillman, B. Rogers, 1997 .