Hans Loeschner

发表

Template masters for substrate conformal imprint lithography generated by charged particle nanopatterning techniques

Falco van Delft, Robert van de Laar, Marc Verschuuren, 2010, European Mask and Lithography Conference.

Stress engineering of SOI silicon stencil masks by boron doping concentration

Hans Loeschner, Ivo W. Rangelow, Joerg Butschke, 2000, Advanced Lithography.

Ion projection lithography: November 2000 status and sub-70-nm prospects

Hans Loeschner, Rainer Kaesmaier, Stefan Schunck, 2000, Other Conferences.

Overview of the ion projection lithography European MEDEA and international program

Hans Loeschner, Rainer Kaesmaier, H. Loeschner, 2000, Advanced Lithography.

Ion projection lithography (IPL): posters presented at the 5th Intrnational SEMATECH Next-Generation Lithography (NGL) workshop

Hans Loeschner, Patrick W. de Jager, Andreas Wolter, 2002, European Mask and Lithography Conference.

eMET: 50 keV electron multibeam mask exposure tool

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2011, Advanced Lithography.

Projection mask-less lithography and nanopatterning with electron and ion multi-beams

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2010, European Mask and Lithography Conference.

Stencil mask technology for ion beam lithography

Hans Loeschner, Ivo W. Rangelow, Joerg Butschke, 1998, Photomask Technology.

Results of proof-of-concept 50keV electron multi-beam mask exposure tool (eMET POC)

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2012, Other Conferences.

IPL stencil mask distortions: experimental and theoretical analysis

Hans Loeschner, Joerg Butschke, Mathias Irmscher, 2000, Advanced Lithography.

Improvements of the membrane bulging method for stress determination of silicon open stencil masks for ion projection lithography

Hans Loeschner, Ivo W. Rangelow, A. Degen, 2000, European Mask and Lithography Conference.

3D Si aperture-plates combined with programmable blanking-plates for multi-beam mask writing

Elmar Platzgummer, Hans Loeschner, Mathias Irmscher, 2009, Photomask Technology.

Masked ion beam lithography and direct structuring on curved surfaces

Elmar Platzgummer, Hans Loeschner, John C. Wolfe, 2003, SPIE Advanced Lithography.

50 keV electron-beam projection maskless lithography (PML2): results obtained with 2,500 programmable 12.5-nm sized beams

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2010, Advanced Lithography.

Mask patterning for the 22nm node using a proton multi-beam projection pattern generator

Elmar Platzgummer, Hans Loeschner, Holger Sailer, 2008, Photomask Technology.

Proof-of-concept tool development for projection mask-less lithography (PML2)

Hans Loeschner, Hans-Joachim Doering, Klaus Reimer, 2005, SPIE Advanced Lithography.

Electron multi-beam technology for mask and wafer writing at 0.1nm address grid

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2013, Advanced Lithography.

Ion projection lithography: advances with integrated tool and resist processes

Hans Loeschner, Rainer Kaesmaier, Andreas Wolter, 2001, SPIE Advanced Lithography.

Projection Mask-Less Lithography (PML2)

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2010 .

MBMW-201: The next generation multi-beam mask writer (Conference Presentation) (Withdrawal Notice)

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2019 .

Placement measurement and FE modeling results for distortion control of stencil masks

Hans Loeschner, Roxann L. Engelstad, Joerg Butschke, 1999, Photomask Technology.

Measures to achieve 20nm IPL stencil mask distortion

Hans Loeschner, Joerg Butschke, Mathias Irmscher, 2002, European Mask and Lithography Conference.

W-CMOS blanking device for projection multibeam lithography

Elmar Platzgummer, Hans Loeschner, Mathias Irmscher, 2010, Photomask Japan.

Stencil mask key parameter measurement and control

Hans Loeschner, Joerg Butschke, Mathias Irmscher, 2000, Advanced Lithography.

Printing results of a proof-of-concept 50keV electron multi-beam mask exposure tool (eMET POC)

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2012, Photomask Technology.

Electron multibeam technology for mask and wafer writing at 0.1 nm address grid

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2013 .

Resistless mask structuring using an ion multi-beam projection pattern generator

Elmar Platzgummer, Hans Loeschner, Joerg Butschke, 2007, SPIE Photomask Technology.

Go proton: investigation on mask patterning for the 22nm hp node using a ML2 multibeam system

Elmar Platzgummer, Hans Loeschner, Holger Sailer, 2009, Photomask Japan.

Ion projection lithography for IC manufacturing

Hans Loeschner, Albrecht Ehrmann, Rainer Kaesmaier, 1999, European Mask and Lithography Conference.

Multi-beam – enabling leading-edge mask writing (Conference Presentation) (Withdrawal Notice)

Elmar Platzgummer, Hans Loeschner, Christoph Spengler, 2018, Photomask Technology.

PN and SOI wafer flow process for stencil mask fabrication

Hans Loeschner, Ivo W. Rangelow, Joerg Butschke, 1999, European Mask and Lithography Conference.

Large-field ion optics for projection and proximity printing and for maskless lithography (ML2)

Elmar Platzgummer, Hans Loeschner, Patrick W. de Jager, 2002, SPIE Advanced Lithography.

Alternative Lithographic Technologies IV

Hans Loeschner, Douglas J. Resnick, Ricardo Ruiz, 2012 .

eMET: development of a 50 keV electron projection multibeam mask exposure tool for the 16nm hp technology node and below

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2010, Photomask Japan.

eMET: 50 keV electron mask exposure tool development based on proven multi-beam projection technology

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2010, Photomask Technology.

eMET POC: realization of a proof-of-concept 50 keV electron multibeam mask exposure tool

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2011, Photomask Technology.

Multibeam particle lithography

Hans Loeschner, Gerhard Stengl, Herbert Vonach, 1999 .

Projection maskless patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates

Elmar Platzgummer, Hans Loeschner, Gerhard Gross, 2007, SPIE Photomask Technology.

Self-supporting mask, methods for making and using same

Hans Loeschner, Gerhard Prof Dr Stengl, 1980 .

Electron Multi-Beam Mask Writer Development for the Semiconductor Industry

Hans Loeschner, 2012 .

Performance of the proof-of-concept multi-beam mask writer (MBMW POC)

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2013, Photomask Technology.

50-keV electron multibeam mask writer for the 11-nm HP node: first results of the proof-of-concept electron multibeam mask exposure tool

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2012 .

Projection maskless lithography

Elmar Platzgummer, Hans Loeschner, Thomas Elster, 2004, SPIE Advanced Lithography.

Charged particle multi-beam lithography evaluations for sub-16nm hp mask node fabrication and wafer direct write

Elmar Platzgummer, Hans Loeschner, Holger Sailer, 2009, Photomask Technology.

Results obtained with the CHARPAN Engineering Tool and prospects of the ion Mask Exposure Tool (iMET)

Elmar Platzgummer, Hans Loeschner, Gerhard Gross, 2008, Photomask Technology.

50 keV electron multibeam mask writer for the 11nm HP node: first results of the proof of concept tool (eMET POC)

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2012, Advanced Lithography.

Demonstrators: a vital step forward for projection mask-less lithography (PML2)

Hans Loeschner, Ramona Eberhardt, Hans-Joachim Doering, 2005, Other Conferences.

Deflection unit for multi-beam mask making

Elmar Platzgummer, Hans Loeschner, Joerg Butschke, 2008, Photomask Technology.

Ion projection lithography: new insights and results of this NGL technology

Hans Loeschner, Thomas Struck, Rainer Kaesmaier, 2001, SPIE Photomask Technology.

Layout postprocessing in ion projection lithography (IPL)

Hans Loeschner, Ernst Haugeneder, Hans Hartmann, 2000, European Mask and Lithography Conference.

Advances in stencil mask technology: control of distortion in ion-projection lithography masks

Robert D. Mohondro, Hans Loeschner, John C. Wolfe, 1995, Photomask Technology.

Projection maskless patterning for nanotechnology applications

Elmar Platzgummer, Hans Loeschner, Gerhard Gross, 2008 .

Ion projection direct structuring for patterning of magnetic media

Elmar Platzgummer, Hans Loeschner, Andreas Dietzel, 2002 .

Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition

Elmar Platzgummer, Hans Loeschner, Gerhard Hobler, 2009 .

Projection Charged Particle Nanolithography and Nanopatterning

Elmar Platzgummer, Hans Loeschner, Christof Klein, 2010 .

Measuring acid generation efficiency in chemically amplified resists with all three beams

Hans Loeschner, Robert L. Brainard, Rainer Kaesmaier, 1999 .

Charged Particle Nanopatterning (CHARPAN) of 2D and 3D masters for flexible replication in Substrate Conformal Imprint Lithography (SCIL)

Elmar Platzgummer, Hans Loeschner, Falco C. M. J. M. van Delft, 2010 .

Large-field particle beam optics for projection and proximity printing and for maskless lithography

Elmar Platzgummer, Hans Loeschner, Joerg Butschke, 2003 .

Resolution improvement of ion projector with a low energy spread multicusp ion source

Hans Loeschner, Ivo W. Rangelow, Ka-Ngo Leung, 1999 .

UV-NIL with working stamps made from Ormostamp

Elmar Platzgummer, Hans Loeschner, Michael Mühlberger, 2009 .

Charged particle nanopatterning

Elmar Platzgummer, Hans Loeschner, 2009 .

Nanoimprint lithography from CHARPAN Tool exposed master stamps with 12.5nmhp

Elmar Platzgummer, Hans Loeschner, Thomas Fromherz, 2011 .

Three-dimensional projection mask-less patterning (PMLP) of micro-lenses and cones: Monitoring and modelling of ion multi-beam kinetic sputtering in GaAs

Elmar Platzgummer, Hans Loeschner, Falco C. M. J. M. van Delft, 2008 .

Line edge roughness investigation on chemically amplified resist materials with masked Helium ion beam lithography

Evangelos Gogolides, Hans Loeschner, George P. Patsis, 2004 .