Kim Dean

发表

Antireflective coating strategies for 193-nm lithography

Jeff D. Byers, Alan D. Stephen, Kim Dean, 1999, Advanced Lithography.

Characterization of the synchrotron-based 0.3-NA EUV microexposure tool at the ALS

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2005 .

Recent results from the Berkeley 0.3-NA EUV microfield exposure tool

Kenneth A. Goldberg, Patrick P. Naulleau, Bruno La Fontaine, 2007, SPIE Advanced Lithography.

Photoresist outgassing at 157 nm exposure

Roderick R. Kunz, Theodore M. Bloomstein, Daniel Miller, 2001, SPIE Advanced Lithography.

Opera Plaza, Pretoria, South Africa

Kim Dean, 2013 .

SEMATECH EUV resist benchmarking results

Patrick P. Naulleau, Andy Ma, Kim Dean, 2007 .

Perfect photoresist for 157nm imaging

Will Conley, Jo Finders, Jeff D. Byers, 2001, SPIE Advanced Lithography.

Effects of material design on extreme ultraviolet (EUV) resist outgassing

Kim Dean, Kenneth E. Gonsalves, Muthiah Thiyagarajan, 2006, SPIE Advanced Lithography.

Material design and evaluation of nanocomposite resist for next generation lithography

Clifford L. Henderson, Kim Dean, Kenneth E. Gonsalves, 2005, SPIE Advanced Lithography.

Characterization of low-order aberrations in the SEMATECH Albany MET tool

Patrick P. Naulleau, Kim Dean, Justin Waterman, 2007, SPIE Advanced Lithography.

Investigation of deep-ultraviolet photoresists on TiN substrates

Kim Dean, Georgia K. Rich, Ronald A. Carpio, 1995, Advanced Lithography.

Photons, electrons, and acid yields in EUV photoresists: a progress report

Franco Cerrina, Piyush Pathak, Patrick Naulleau, 2008, SPIE Advanced Lithography.

157-nm alternating phase-shifting mask design and high-NA images

Jeff Meute, Kim Dean, Peter D. Brooker, 2003, SPIE Photomask Technology.

Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool

Kenneth A. Goldberg, Sungmin Huh, Patrick P. Naulleau, 2008, SPIE Advanced Lithography.

Aberration determination in early 157-nm exposure system

Greg P. Hughes, Bruce W. Smith, Cesar M. Garza, 2002, SPIE Advanced Lithography.

Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation

Seth Kruger, Robert L. Brainard, Chimaobi Mbanaso, 2008, SPIE Advanced Lithography.

Optimization of etch conditions for a silicon-containing methacrylate-based bilayer resist for 193-nm lithography

Andrew J. Blakeney, Allen H. Gabor, Daniel Miller, 1998, Advanced Lithography.

Polyhedral oligomeric silsesquioxane (POSS) based resist materials for 157-nm lithography

Evangelos Gogolides, Kim Dean, Panagiotis Argitis, 2003, SPIE Advanced Lithography.

Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH

Lisa R. Rich, Jeff Meute, Julian S. Cashmore, 2002, SPIE Advanced Lithography.

Benchmarking of commercial EUVL resists at SEMATECH

Patrick P. Naulleau, Andy Ma, Kim Dean, 2008, SPIE Advanced Lithography.

Environmental stability of chemically amplified resists: proposing an industry standard methodology for testing

Kim Dean, Oleg P. Kishkovich, 2000, Advanced Lithography.

Resolution, LER, and sensitivity limitations of photoresists

Patrick P. Naulleau, Gregg M. Gallatin, Robert L. Brainard, 2008, SPIE Advanced Lithography.

Opera Plaza, Pretoria, South Africa (photos)

Kim Dean, 2013 .

Lithographic characterization of low-order aberrations in a 0.3-NA EUV microfield exposure tool

Kenneth A. Goldberg, Patrick Naulleau, Kim Dean, 2006, SPIE Advanced Lithography.

Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists

Kenneth A. Goldberg, Adam R. Pawloski, Patrick P. Naulleau, 2006, SPIE Advanced Lithography.

Aerial-image modeling for the extreme ultraviolet microfield exposure tool at SEMATECH North

Patrick P. Naulleau, Kim Dean, Klaus Lowack, 2006, SPIE Advanced Lithography.

iLearn and iTeach with the iPad

Kim Dean, Jennifer Henderson, 2013 .

Extreme ultraviolet resist outgassing and its effect on nearby optics

Yayi Wei, Warren Montgomery, Obert Wood, 2008, SPIE Advanced Lithography.

Investigation of the current resolution limits of advanced EUVresists

Kenneth A. Goldberg, Adam R. Pawloski, Paul Denham, 2005 .

Advanced 0.3-NA EUV lithography capabilities at the ALS

Kenneth A. Goldberg, Patrick Naulleau, Paul Denham, 2005 .

Newly developed polymer bound photoacid generator resist for sub-100-nm pattern by EUV lithography

Kim Dean, Kenneth E. Gonsalves, Muthiah Thiyagarajan, 2005, SPIE Advanced Lithography.

Film quantum yields of EUV and ultra-high PAG photoresists

Emil C. Piscani, Jeff Byers, Matthew Malloy, 2008, SPIE Advanced Lithography.

The EUV resist test center at SEMATECH-North

Kim Dean, Matt Malloy, Mike Lercel, 2006, SPIE Advanced Lithography.

Effects of airborne molecular contamination on 157-nm resists: AMC friend or foe?

Kim Dean, Shashikant Patel, Karen Turnquest, 2004, SPIE Advanced Lithography.

EUV microexposures at the ALS using the 0.3-NA MET projection optics

Kenneth A. Goldberg, Patrick Naulleau, Brian Hoef, 2005, SPIE Advanced Lithography.

Quantitative measurement of EUV resist outgassing

Yu-Jen Fan, Leonid Yankulin, Chimaobi Mbanaso, 2007, European Mask and Lithography Conference.

Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source

Kenneth A. Goldberg, Patrick P. Naulleau, Erik H. Anderson, 2005 .

The Status of 157nm Lithography Development

Will Conley, Kim Dean, Stefan Hien, 2001 .

Molecular Challenges of Immersion and Extreme Ultraviolet (EUV) Resists

Kim Dean, David R. Stark, 2006 .

Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

Kenneth A. Goldberg, Patrick P. Naulleau, Christopher N. Anderson, 2007 .

Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise

Patrick P. Naulleau, Gregg M. Gallatin, Robert L. Brainard, 2008 .

Effects of Airborne Molecular Contamination on DUV Photoresists

Ronald A. Carpio, John S. Petersen, Daniel Miller, 1997 .

SURVEY OF PROCESSING AFFECTS ON SUBSTRATE COMPATIBILITY OF CHEMICALLY AMPLIFIED RESISTS

James W. Thackeray, John L. Sturtevant, Ronald A. Carpio, 1995 .

Improved lithographic performance for EUV resists based on polymers having a photoacid generator (PAG) in the backbone

Kim Dean, Muthiah Thiyagarajan, Kenneth E. Consalves, 2005 .

Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

Kenneth A. Goldberg, Warren Montgomery, Patrick P. Naulleau, 2008 .