Hua-Yu Liu

发表

Challenges of 50-nm gate process in alternating phase shifting lithography

Cheng Yu Fang, Kuei-Chun Hung, Z. H. Huang, 2002, SPIE Advanced Lithography.

A full-chip 3D computational lithography framework

Yen-Wen Lu, Qian Zhao, Mu Feng, 2012, Advanced Lithography.

Demonstration of an effective flexible mask optimization (FMO) flow

Stanislas Baron, Russell Dover, Hua-Yu Liu, 2012, Advanced Lithography.

Impact of photomasks on linewidth variation

Hua-Yu Liu, Robert E. Gleason, 1997, Photomask Technology.

Separable OPC models for computational lithography

Lieve Van Look, Geert Vandenberghe, Jo Finders, 2008, Photomask Japan.

Manufacturability evaluation of deep submicron exposure tools using statistical metrology

Costas J. Spanos, Hua-Yu Liu, Crid Yu, 1995, Proceedings of International Symposium on Semiconductor Manufacturing.

Full-chip source and mask optimization

Hong Chen, Wei Yuan, Yen-Wen Lu, 2011, Advanced Lithography.

Use of short-loop electrical measurements for yield improvement

Costas J. Spanos, Duane S. Boning, J. E. Chung, 1995 .

Patterning tool characterization by causal variability decomposition

Costas J. Spanos, Hua-Yu Liu, Crid Yu, 1996 .

A novel element differential method for solid mechanical problems using isoparametric triangular and tetrahedral elements

Jun Lv, Hua-Yu Liu, Xiao-Wei Gao, 2019, Comput. Math. Appl..

Improved model predictability by machine data in computational lithography and application to laser bandwidth tuning

Xu Xie, Qian Zhao, Paul van Adrichem, 2009, Advanced Lithography.

Contributions of stepper lenses to systematic CD errors within exposure fields

Hua-Yu Liu, Robert E. Gleason, Crid Yu, 1995, Advanced Lithography.

Application of alternating phase-shifting masks to 140-nm gate patterning: linewidth control improvements and design optimization

Linard Karklin, Yagyensh C. Pati, Yao-Ting Wang, 1997, Photomask Technology.

Source mask optimization methodology (SMO) and application to real full chip optical proximity correction

Stephen Hsu, Xiaofeng Liu, Carl Babcock, 2012, Advanced Lithography.

Lithography process calibration with applications in defect printability analysis

Linard Karklin, Hua-Yu Liu, Shao-Po Wu, 1998, Photomask Technology.

Predictive focus exposure modeling (FEM) for full-chip lithography

Yu Cao, Mu Feng, Jun Ye, 2006, SPIE Advanced Lithography.

Fabrication of 0.1-um T-shaped gates by phase-shifting optical lithography

Nigel R. Farrar, Hua-Yu Liu, Robert E. Gleason, 1993, Advanced Lithography.

Full field lithographical verification using scanner and mask intrafield fingerprint

L. Depre, Frank Sundermann, E. Yesilada, 2012, Advanced Lithography.

Economical sampling algorithm using Fourier analysis for mapping wafer critical dimension variations

Roger Fabian W. Pease, C. N. Berglund, Hua-Yu Liu, 1998 .

Fast and accurate 3D mask model for full-chip OPC and verification

Yu Cao, Jiong Jiang, Peng Liu, 2007, SPIE Advanced Lithography.

Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performance

Robert John Socha, Keith Gronlund, Zhipan Li, 2009, Lithography Asia.

Application of alternating phase-shifting masks to 140-nm gate patterning: II. Mask design and manufacturing tolerances

Linard Karklin, Yagyensh C. Pati, Yao-Ting Wang, 1998, Advanced Lithography.

Scanner-specific separable models for computational lithography

Qian Zhao, Xu Xie, Hua-Yu Liu, 2008, Photomask Technology.

Comparisons of critical parameters for high- and low-activation-energy deep-UV photoresists

Will Conley, Nigel R. Farrar, Bill Peterson, 1998, Advanced Lithography.

Aerial image simulations of soft and phase defects in 193-nm lithography for 100-nm node

Linard Karklin, Vicky Philipsen, Rik M. Jonckheere, 2002, SPIE Advanced Lithography.

EUV source-mask optimization for 7nm node and beyond

Paul van Adrichem, Thijs Hollink, Stephen Hsu, 2014, Advanced Lithography.

Full-chip lithography manufacturability check for yield improvement

Chien-Ming Wang, Benjamin Szu-Min Lin, Hua-Yu Liu, 2006, SPIE Advanced Lithography.

Patterning 80-nm gates using 248-nm lithography: an approach for 0.13-μm VLSI manufacturing

Chien-Ming Wang, Chien-Wen Lai, Hua-Yu Liu, 2001, SPIE Advanced Lithography.

Can we do 0.15µm lithography with KrF

Will Conley, Nigel R. Farrar, Hua-Yu Liu, 1999 .

An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging

Robert John Socha, Keith Gronlund, Steve Hansen, 2008, Lithography Asia.

Surface Characterization Of Aluminum Substrates Exposed To Photoresist Developers

Hua-Yu Liu, K. A. Graziano, C. S. Allen, 1989, Advanced Lithography.

Development of a computational lithography roadmap

Yu Cao, Robert John Socha, J. Fung Chen, 2008, SPIE Advanced Lithography.

Freeform source optimization for improving litho-performance of warm spots

Chun-Wei Wu, Chiang-Lin Shih, Stephen Hsu, 2011, Photomask Technology.

Laser proximity correction for advanced mask manufacturing

Hua-Yu Liu, Michael Chang, Jiunn-Hung Chen, 2001, Photomask Japan.

Wafer printability simulation accuracy based on UV optical inspection images of reticle defects

Linard Karklin, Larry S. Zurbrick, Maciej W. Rudzinski, 1999, Advanced Lithography.

Alternating phase shifting mask implementation to 0.1-μm logic gates

Burn Jeng Lin, Chung-Hsing Chang, Hua-Yu Liu, 2002, SPIE Photomask Technology.

100 nm CMOS gates patterned with 3σ below 10 nm

Peng Cheng, Min Cao, Hua-Yu Liu, 1998 .

EUV resolution enhancement techniques (RETs) for k1 0.4 and below

Stephen Hsu, Jianjun Jia, Keith Gronlund, 2015, Advanced Lithography.

Extending ArF to the 65-nm node with full-phase lithography

Geert Vandenberghe, Kurt G. Ronse, Christophe Pierrat, 2003, SPIE Advanced Lithography.