K. Murakami

发表

Enhancement of reflectivity of multilayer neutron mirrors by ion polishing: optimization of the ion beam parameters

K. Soyama, K. Soyama, W. Ishiyama, 1999 .

Low-Stress Molybdenum/Silicon Multilayer Coatings for Extreme Ultraviolet Lithography

M. Shiraishi, W. Ishiyama, K. Murakami, 2000, Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387).

Schwarzschild microscope for carbon Kα radiation.

H. Nagata, K. Murakami, T. Oshino, 1993, Applied optics.

Development for the alignment procedure of three-aspherical mirror optics

Takeo Watanabe, Hiroo Kinoshita, Katsuhiko Murakami, 2000, Advanced Lithography.

Development of the large field extreme ultraviolet lithography camera

S. Okazaki, K. Hamamoto, Takeo Watanabe, 2000 .

Normal-Incidence X-Ray Microscope for Carbon Kα Radiation with 0.5 µm Resolution

K. Murakami, Hiroshi Nakamura, T. Oshino, 1992 .

Narrow-bandpass multilayer mirrors for an extreme-ultraviolet Doppler telescope.

T. Yoshida, W. Ishiyama, K. Murakami, 1999, Applied optics.

On the Hall Coefficients of Liquid Copper Alloys

K. Murakami, S. Takeuchi, 1974 .

Characteristics of Embrittlement of Continuously Cast Steel near the Solidification Temperature

K. Murakami, T. Kitagawa, Hideaki Mizukami, 1995 .

Development of EUV lithography tools at Nikon

Hiroyuki Kondo, Hiroshi Chiba, Tetsuya Oshino, 2011, Advanced Lithography.

EUV wavefront measurement of six-mirror optics using EWMS

Masanobu Hasegawa, Hideo Yokota, Takayuki Hasegawa, 2008, SPIE Advanced Lithography.

Ring-Field Extreme Ultraviolet Exposure System Using Aspherical Mirrors

Hiroaki Oizumi, Masaaki Ito, Hiromasa Yamanashi, 1998 .

Effect of argon and non-argon ion impingement on the stress reduction of multilayers for extreme-ultraviolet lithography

Katsuhiko Murakami, Tetsuya Oshino, Noriaki Kandaka, 2002, SPIE Advanced Lithography.

Stress control of Mo/Si-based multilayer coatings deposited by ion-beam sputtering

Katsuhiko Murakami, Masayuki Shiraishi, M. Shiraishi, 2001, SPIE Optics + Photonics.

In-situ stress measurement of molybdenum/silicon multilayers and low-stress multilayers for extreme-ultraviolet lithography

Katsuhiko Murakami, Tetsuya Oshino, Noriaki Kandaka, 2001, SPIE Advanced Lithography.

Stress reduction of molybdenum/silicon multilayers deposited by ion-beam sputtering

Katsuhiko Murakami, Tetsuya Oshino, Masayuki Shiraishi, 2000, Advanced Lithography.

Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography

Takeo Watanabe, Hiroo Kinoshita, Katsuhiko Murakami, 2000, Advanced Lithography.

Electroplated Reflection Masks for Soft X-Ray Projection Lithography

Hiroaki Oizumi, Sumito Shimizu, Katsuhiko Murakami, 1995 .

Resist Performance in 5 nm Soft X-Ray Projection Lithography

H. Nagata, K. Murakami, Y. Yamashita, 1994 .

Reduction Imaging at 4.5 nm with Schwarzschild Optics

H. Nagata, K. Murakami, Y. Yamashita, 1994 .

Fabrication of 0.1 µm Line-and-Space Patterns using Soft X-Ray Reduction Lithography

Takao Taguchi, Hiroaki Oizumi, Katsuhiko Murakami, 1994 .

Sub-0.1 µm Resist Patterning in Soft X-Ray (13 nm) Projection Lithography

Takao Taguchi, Hiroaki Oizumi, Katsuhiko Murakami, 1993 .

Development of a Low Aspect Ratio, Helicon Plasma Source using a Flat Spiral Antenna

Kenji Tanaka, K. Murakami, I. Funaki, 2005 .

In situ x-ray absorption near-edge structure analysis for extreme ultraviolet lithography projection optics contamination

Masahito Niibe, Katsuhiko Murakami, Takashi Aoki, 2007 .

The Effect of Crystallization of Mold Powder on the Heat Transfer in Continuous Casting Mold

Keiji Watanabe, A. Miyamoto, K. Murakami, 1997 .

Resist performance in 5nm and 13nm soft X-ray projection lithography

H. Nagata, K. Murakami, Y. Yamashita, 1995 .

Measurement of the half-value layer for CT systems in a single-rotation technique: Reduction of stray radiation with lead apertures.

K. Murakami, H. Kubo, A. Fukuda, 2020, Physica medica (Testo stampato).

Aluminum Evaporation from Titanium Alloys in EB Hearth Melting Process.

K. Murakami, Hideo Nakamura, Tomoo Isawa, 1992 .

Mechanical Charactristics of Metallic Hollow Sphere Structure

K. Shinagawa, K. Murakami, Y. Mihara, 2005 .

Estimation of Structural Anisotropy and Strength of Sintered Hollow Sphere Body

K. Shinagawa, K. Murakami, Y. Mihara, 2008 .

Compressive Behavior of Iron Hollow Sphere at Elevated Temperatures

K. Shinagawa, K. Murakami, Y. Mihara, 2006 .

Double-grating lateral shearing interferometer for EUV optics at-wavelength measurement

Masanobu Hasegawa, Akiyoshi Suzuki, Katsuhiko Murakami, 2005, SPIE Advanced Lithography.

Development of multilayer mirrors for the XUV Doppler telescope

Hirohisa Hara, Toshifumi Shimizu, Shin'ichi Nagata, 1997, Optics & Photonics.

Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength

Masaru Sasago, Masayuki Endo, Hiroyuki Kondo, 2002 .

Reflectivity enhancement of large m-Qc supermirror by ion polishing

K. Soyama, K. Murakami, H. Tsunoda, 2004 .