Hyeong-Soo Kim

发表

Characterization of the quarter-micron i-line lithography using a top surface imaging process

Chang-Moon Lim, Seung-Chan Moon, Soo-Han Choi, 1994, Advanced Lithography.

Influence of process parameters on the lithographic performance characterization in the top imaging process by silylation

Seung-Chan Moon, Jin-Woong Kim, Soo-Han Choi, 1993, Advanced Lithography.

The suppression method of powder formation in ArF photoresist

Cheol-Kyu Bok, Seung-Chan Moon, Myoung-Soo Kim, 2006, SPIE Advanced Lithography.

Intrafield critical dimension variation using KrF scanner system for 0.18-μm lithography

Ki-Ho Baik, Donggyu Yim, Hyeong-Soo Kim, 1998, Advanced Lithography.

Electrical property study of line-edge roughness in top surface imaging process by silylation

Hyoung-Gi Kim, Myoung-Soo Kim, Ki Ho Baik, 1999, Advanced Lithography.

Positive and negative tone double patterning lithography for 50nm flash memory

Chang-Moon Lim, Keundo Ban, Seung-Chan Moon, 2006, SPIE Advanced Lithography.

Aberration effects in the region of 0.18-μm lithography with KrF excimer stepper

Ki-Ho Baik, Chang-Moon Lim, Donggyu Yim, 1997, Advanced Lithography.

Comparative study of DRAM cell patterning between ArF immersion and EUV lithography

Sunyoung Koo, Jun-Taek Park, Chang-Moon Lim, 2009, Advanced Lithography.

Effects of alkali treatment on ArF resist process

Keun-Kyu Kong, Hyeong-Soo Kim, Jae-Chang Jung, 2003, SPIE Advanced Lithography.

Analysis of total CD uniformity at sub-100-nm DRAM patterning by using KrF lithography

Jin-Soo Kim, Keun-Kyu Kong, Young-Sik Kim, 2003, SPIE Advanced Lithography.

Effective alignment techniques and their implementation to enhance total overlay accuracy on highly reflective films

Ki-Ho Baik, Seung-Chan Moon, Soo-Han Choi, 1995, Advanced Lithography.

Double exposure technology using silicon containing materials

Chang-Moon Lim, Cheol-Kyu Bok, Seung-Chan Moon, 2006, SPIE Advanced Lithography.

Feasibility of EUVL thin absorber mask for minimization of mask shadowing effect

Sunyoung Koo, Jun-Taek Park, Chang-Moon Lim, 2010, Advanced Lithography.

The analysis of optical lithography at 2-dimensional dense structure

Donggyu Yim, Jin-Woong Kim, Jin-Soo Kim, 2008, SPIE Advanced Lithography.

Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era

Jin-Soo Kim, Keun-Kyu Kong, Hyeong-Soo Kim, 2003, SPIE Advanced Lithography.

EUV-patterning characterization using a 3D mask simulation and field EUV scanner

Sunyoung Koo, Jun-Taek Park, Chang-Moon Lim, 2009, Advanced Lithography.

Novel 193-nm single-layer resist containing a multifunctional monomer

Ki-Ho Baik, Jae Chang Jung, Geunsu Lee, 1999, Advanced Lithography.

Resolution enhanced top anti reflective coating materials for ArF immersion lithography

Keundo Ban, Cheol-Kyu Bok, Seung-Chan Moon, 2006, SPIE Advanced Lithography.

Study on imaging characterization of ArF high index immersion lithography

Jun-Taek Park, Seung-Chan Moon, Jin-Soo Kim, 2008, Lithography Asia.

Investigation on the relationship between CD and CDU in memory devices

Sung-Koo Lee, Choi-Dong Kim, Keunjun Kim, 2016, SPIE Advanced Lithography.

Mesh patterning process for 40nm contact hole

Junghyung Lee, Junggun Heo, Hyunkyung Shim, 2010, Advanced Lithography.

Non-chemically amplified 193-nm top surface imaging photoresist development: polymer substituent and polydispersity effects

Donald W. Johnson, Hyoung-Gi Kim, Myoung-Soo Kim, 1999, Advanced Lithography.

Implementation of contact hole patterning performance with KrF resist flow process for 80nm DRAM application

Hyeong-Soo Kim, Hyoung-ryeun Kim, DongHeok Park, 2004, SPIE Advanced Lithography.

Printing 95-nm DRAM full chip patterns in KrF lithography

Jin-Soo Kim, Keun-Kyu Kong, Young-Sik Kim, 2003, SPIE Advanced Lithography.

Sub 90nm DRAM patterning by using modified chromeless PSM at KrF lithography era

Keun-Kyu Kong, Young-Sik Kim, Hyeong-Soo Kim, 2004, SPIE Advanced Lithography.

Improvement of alignment and overlay accuracy on amorphous carbon layers

Chang-Moon Lim, Keundo Ban, Cheol-Kyu Bok, 2006, SPIE Advanced Lithography.

Low power switching of Si-doped Ta2O5 resistive random access memory for high density memory application

Hyeong-Soo Kim, S. Kim, Suock Chung, 2016 .

The Implementation Of Sub-150nm Contact Hole Pattern By Resist Flow Process

Ki-Ho Baik, Chang-Nam Ahn, Cheol-Kyu Bok, 1998, Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135).