Y. Sano

发表

Thinning of silicon-on-insulator wafers by numerically controlled plasma chemical vaporization machining

Yuzo Mori, Yasuhisa Sano, Kazuya Yamamura, 2004 .

Breaking the 10 nm barrier in hard-X-ray focusing

T. Ishikawa, Y. Nishino, K. Tamasaku, 2010 .

Efficient focusing of hard x rays to 25nm by a total reflection mirror

T. Ishikawa, Y. Nishino, K. Tamasaku, 2007 .

Direct determination of the wave field of an x-ray nanobeam

Hidekazu Mimura, Takashi Kimura, Kazuto Yamauchi, 2008 .

Wavefront Control System for Phase Compensation in Hard X-ray Optics

T. Ishikawa, Y. Nishino, K. Tamasaku, 2009 .

Extended knife-edge method for characterizing sub-10-nm X-ray beams

T. Ishikawa, Y. Nishino, K. Tamasaku, 2010 .

Single-nanometer focusing of hard x-rays by Kirkpatrick–Baez mirrors

T. Ishikawa, Y. Nishino, K. Tamasaku, 2011, Journal of physics. Condensed matter : an Institute of Physics journal.

Focusing of X-ray free-electron laser pulses with reflective optics

T. Ishikawa, Y. Inubushi, H. Ohashi, 2012, Nature Photonics.

Microstitching interferometry for x-ray reflective optics

T. Ishikawa, K. Tamasaku, M. Yabashi, 2003 .

Simulation and Experimental Study of Wavefront Measurement Accuracy of the Pencil-Beam Method

T. Ishikawa, Y. Kohmura, M. Yabashi, 2016 .

X-ray nanofocusing using a piezoelectric deformable mirror and at-wavelength metrology methods

T. Ishikawa, Y. Kohmura, K. Tamasaku, 2013 .

Diffraction-limited two-dimensional hard-x-ray focusing at the 100nm level using a Kirkpatrick-Baez mirror arrangement

T. Ishikawa, Y. Nishino, K. Tamasaku, 2005 .

Fabrication of elliptical mirror at nanometer-level accuracy for hard x-ray focusing by numerically controlled plasma chemical vaporization machining

T. Ishikawa, K. Tamasaku, M. Yabashi, 2003 .

Plasma Chemical Vaporization Machining (CVM) for Fabrication of Optics

Y. Mori, K. Yamamura, Y. Sano, 1998 .

Fabrication of optics by use of plasma chemical vaporization machining with a pipe electrode.

Y. Mori, K. Yamamura, Y. Sano, 2002, Applied optics.

Fabrication of small complex-shaped optics by plasma chemical vaporization machining with a microelectrode.

Y. Mori, K. Yamamura, Y. Sano, 2006, Applied optics.

Wave-optical evaluation of interference fringes and wavefront phase in a hard-x-ray beam totally reflected by mirror optics.

T. Ishikawa, K. Tamasaku, M. Yabashi, 2005, Applied optics.

Hard X-ray Diffraction-Limited Nanofocusing with Kirkpatrick-Baez Mirrors

T. Ishikawa, Y. Nishino, K. Tamasaku, 2005 .

Elemental mapping of frozen-hydrated cells with cryo-scanning X-ray fluorescence microscopy

T. Ishikawa, Y. Nishino, K. Tamasaku, 2010 .

Relative angle determinable stitching interferometry for hard x-ray reflective optics

T. Ishikawa, Y. Nishino, K. Tamasaku, 2005 .

Generation of 1020 W cm−2 hard X-ray laser pulses with two-stage reflective focusing system

T. Ishikawa, Y. Inubushi, H. Ohashi, 2014, Nature Communications.

Wavefield characterization of nearly diffraction-limited focused hard x-ray beam with size less than 10 nm.

T. Ishikawa, Y. Nishino, K. Tamasaku, 2010, The Review of scientific instruments.

Characteristics and Mechanism of Catalyst-Referred Etching Method: Application to 4H-SiC

Kazuto Yamauchi, Yoshitada Morikawa, Yasuhisa Sano, 2018, Int. J. Autom. Technol..

Stitching interferometric metrology for steeply curved x‐ray mirrors

Y. Sano, H. Mimura, K. Yamauchi, 2008 .

Ultrafast observation of lattice dynamics in laser-irradiated gold foils

Y. Fujimoto, Y. Inubushi, T. Togashi, 2017 .

Plasma-Based Nanomanufacturing Under Atmospheric Pressure

K. Yamamura, Y. Sano, 2013 .

Development of plasma chemical vaporization machining

Yuzo Mori, Kazuto Yamauchi, Yasuhisa Sano, 2000 .

Novel abrasive-free planarization of 4H-SiC (0001) using catalyst

Hidekazu Mimura, Kenta Arima, Keita Yagi, 2006 .

Atomic-scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst

Hidekazu Mimura, Kazuto Yamauchi, Kenta Arima, 2007 .

Improvement of the thickness distribution of a quartz crystal wafer by numerically controlled plasma chemical vaporization machining

Yuzo Mori, Yasuhisa Sano, Katsuyoshi Endo, 2005 .

Ultraprecision Machining Utilizing Numerically Controlled Scanning of Localized Atmospheric Pressure Plasma

Hidekazu Mimura, Yuzo Mori, Kazuto Yamauchi, 2006 .

Improvement of the Thickness Distribution of AT Cut Quartz Crystal Wafer by Open-air Type Plasma Chemical Vaporization Machining

Y. Mori, K. Yamamura, Y. Sano, 2007 .

High-resolution micro channel-cut crystal monochromator processed by plasma chemical vaporization machining for a reflection self-seeded X-ray free-electron laser.

M. Yabashi, Y. Sano, K. Yamauchi, 2020, Optics express.

A micro channel-cut crystal X-ray monochromator for a self-seeded hard X-ray free-electron laser.

M. Yabashi, Y. Sano, K. Yamauchi, 2018, Journal of synchrotron radiation.

Improved reflectivity of platinum/carbon multilayers for X-ray mirrors by carbon doping into platinum layer

Kazuto Yamauchi, Satoshi Matsuyama, Yasuhisa Sano, 2012 .

Damage threshold of platinum/carbon multilayers under hard X-ray free-electron laser irradiation.

T. Ishikawa, H. Ohashi, M. Yabashi, 2015, Optics express.

The study of fabrication of the x-ray mirror by numerically controlled plasma chemical vaporization machining: Development of the machine for the x-ray mirror fabrication

Yuzo Mori, Yasuhisa Sano, Kazuya Yamamura, 2000 .

High-throughput deterministic plasma etching using array-type plasma generator system.

Y. Sano, K. Yamauchi, S. Matsuyama, 2021, The Review of scientific instruments.

Development of array-type atmospheric-pressure RF plasma generator with electric on-off control for high-throughput numerically controlled processes.

Y. Sano, K. Yamauchi, S. Matsuyama, 2016, The Review of scientific instruments.

Two-dimensional Submicron Focusing of Hard X-rays by Two Elliptical Mirrors Fabricated by Plasma Chemical Vaporization Machining and Elastic Emission Machining

T. Ishikawa, K. Tamasaku, M. Yabashi, 2003 .

Development of Ultra Precision Finishing Method for Quartz Crystal Wafer Utilizing Atmospheric Pressure Plasma

Y. Mori, K. Yamamura, Y. Sano, 2007 .

Ultraprecision Finishing of Photomask Substrate by Utilizing Atmospheric Pressure Plasma

Y. Mori, K. Yamamura, Y. Sano, 2007 .

Ultraprecision Finishing Process for Improving Thickness Distribution of Quartz Crystal Wafer by Utilizing Atmospheric Pressure Plasma

K. Yamamura, Y. Sano, Y. Mori, 2006, 2006 IEEE International Frequency Control Symposium and Exposition.

Development of the Measurement System with Interferometers for Ultraprecise X-ray Mirror

T. Ishikawa, K. Tamasaku, M. Yabashi, 2003 .

Wave-optical evaluation of reflected X-ray intensity and wavefront distribution in total reflection hard X-ray by mirror optics.

T. Ishikawa, K. Tamasaku, M. Yabashi, 2003 .

Simulation of concave-convex imaging mirror system for development of a compact and achromatic full-field x-ray microscope.

Y. Sano, K. Yamauchi, S. Matsuyama, 2017, Applied optics.

Compact reflective imaging optics in hard X-ray region based on concave and convex mirrors.

T. Ishikawa, Y. Kohmura, M. Yabashi, 2019, Optics express.

Development of mirror manipulator for hard-x-ray nanofocusing at sub-50-nm level

T. Ishikawa, Y. Nishino, K. Tamasaku, 2006 .

Bias-Assisted Photochemical Planarization of GaN(0001) Substrate with Damage Layer

Y. Sano, K. Yamauchi, S. Matsuyama, 2013 .

The Polishing Effect of SiC Substrates in Femtosecond Laser Irradiation Assisted Chemical Mechanical Polishing (CMP)

J. Yuan, Q. Deng, S. Kurokawa, 2017 .

Characterization of temporal coherence of hard X-ray free-electron laser pulses with single-shot interferograms

J. Hastings, Y. Inubushi, T. Togashi, 2017, IUCrJ.

Fabrication of Ultraprecisely Figured Elliptical Mirror for Nano-Focusing of Hard X-ray and Evaluation of Focusing Properties

T. Ishikawa, Y. Nishino, K. Tamasaku, 2005 .

Fabrication of the Elliptical Mirror for Synchrotron hard X-ray by Plasma Chemical Vaporization Machining and Elastic Emission Machining and the Evaluation of the Focusing Performances.

T. Ishikawa, K. Tamasaku, M. Yabashi, 2002 .

Improvement of I-V Characteristics of Schottky Barrier Diode by 4H-SiC Surface Planarization

Y. Sano, T. Katsuno, H. Fujiwara, 2015 .

Chemical etching of silicon carbide in pure water by using platinum catalyst.

Y. Sano, K. Yamauchi, S. Matsuyama, 2017, Applied physics letters.

Planarization of GaN(0001) Surface by Photo-Electrochemical Method with Solid Acidic or Basic Catalyst

T. Okamoto, Y. Sano, H. Mimura, 2009 .

Formation of wide and atomically flat graphene layers on ultraprecision-figured 4H-SiC(0001) surfaces

T. Okamoto, Y. Sano, K. Yamauchi, 2011 .

Wavelength-tunable split-and-delay optical system for hard X-ray free-electron lasers.

Kazuto Yamauchi, Tetsuya Ishikawa, Satoshi Matsuyama, 2016, Optics express.

Thinning of 2-Inch SiC Wafer by Plasma Chemical Vaporization Machining Using Cylindrical Rotary Electrode

K. Yamamura, Y. Sano, H. Mimura, 2011 .

Improvement of Removal Rate in Abrasive-Free Planarization of 4H-SiC Substrates Using Catalytic Platinum and Hydrofluoric Acid

T. Okamoto, Y. Sano, K. Yamauchi, 2012 .

Numerically controlled atmospheric-pressure plasma sacrificial oxidation using electrode arrays for improving silicon-on-insulator layer uniformity

Y. Sano, K. Yamauchi, S. Matsuyama, 2014 .

Fabrication of ultrathin and highly uniform silicon on insulator by numerically controlled plasma chemical vaporization machining.

Hidekazu Mimura, Yuzo Mori, Kazuto Yamauchi, 2007, The Review of scientific instruments.

Dynamic fracture of tantalum under extreme tensile stress

T. Ishikawa, K. Tanaka, Y. Inubushi, 2017, Science Advances.

Platinum-catalyzed hydrolysis etching of SiC in water: A density functional theory study

Y. Sano, K. Yamauchi, S. Matsuyama, 2018 .

The Reactions of Hot Deuterium Atoms with Ethylene

Y. Sano, S. Sato, 1971 .

Element array by scanning X-ray fluorescence microscopy after cis-diamminedichloro-platinum(II) treatment.

T. Ishikawa, Y. Nishino, K. Tamasaku, 2005, Cancer research.

Catalyzed chemical polishing of SiO2 glasses in pure water.

Y. Sano, K. Yamauchi, S. Matsuyama, 2019, The Review of scientific instruments.

Study on the mechanism of platinum-assisted hydrofluoric acid etching of SiC using density functional theory calculations

Y. Sano, K. Yamauchi, K. Inagaki, 2015 .

Local atomic configuration of graphene, buffer layer, and precursor layer on SiC(0001) by photoelectron diffraction

T. Matsushita, T. Okamoto, Y. Sano, 2015 .

Mechanism of atomic-scale passivation and flattening of semiconductor surfaces by wet-chemical preparations

Y. Sano, T. Ono, K. Yamauchi, 2011, Journal of physics. Condensed matter : an Institute of Physics journal.

Development of basic-type CMP/P-CVM fusion processing system (Type A) and its fundamental characteristics

S. Kurokawa, Y. Sano, K. Yamauchi, 2014, Proceedings of International Conference on Planarization/CMP Technology 2014.

First-principles simulations of removal process in EEM (Elastic Emission Machining)

Yuzo Mori, Kazuto Yamauchi, Yasuhisa Sano, 1999 .

Investigation of the Surface Removal Process of Silicon Carbide in Elastic Emission Machining

Hidekazu Mimura, Yuzo Mori, Kazuto Yamauchi, 2007 .

High-efficiency planarization method combining mechanical polishing and atmospheric-pressure plasma etching for hard-to-machine semiconductor substrates

S. Kurokawa, Y. Sano, K. Yamauchi, 2016 .

Optimization of machining conditions of basic-type CMP/P-CVM fusion processing using SiC substrate

S. Kurokawa, Y. Sano, K. Yamauchi, 2015, 2015 International Conference on Planarization/CMP Technology (ICPT).

Basic Study on Etching Selectivity of Plasma Chemical Vaporization Machining by Introducing Crystallographic Damage into Work Surface

O. Ohnishi, M. Uneda, S. Kurokawa, 2014 .

Dependence of GaN removal rate of plasma chemical vaporization machining on mechanically introduced damage

O. Ohnishi, M. Uneda, S. Kurokawa, 2014 .

Hard x-ray nano-focusing at 40nm level using K-B mirror optics for nanoscopy/spectroscopy

Hidekazu Mimura, Yuzo Mori, Kazuto Yamauchi, 2005, SPIE Optics + Photonics.

Surface gradient integrated profiler for X-ray and EUV optics

Yuzo Mori, Kazuhiro Enami, Yasuhisa Sano, 2007 .

A Study on a Surface Preparation Method for Single-Crystal SiC Using an Fe Catalyst

Kazuto Yamauchi, Keita Yagi, Yasuhisa Sano, 2009 .

Atomic-scale Characterization of HF-treated 4H-SiC(0001)1×1 Surfaces by Scanning Tunneling Microscopy

Y. Sano, H. Mimura, K. Yamauchi, 2007 .

Nearly diffraction-limited X-ray focusing with variable-numerical-aperture focusing optical system based on four deformable mirrors

Takashi Kimura, Kazuto Yamauchi, Yoshiki Kohmura, 2016, Scientific Reports.

Development of piezoelectric adaptive mirror for hard x-ray nanofocusing

Takashi Kimura, Kazuto Yamauchi, Yoshiki Kohmura, 2012, Other Conferences.

Experimental and simulation study of undesirable short-period deformation in piezoelectric deformable x-ray mirrors.

Takashi Kimura, Kazuto Yamauchi, Yoshiki Kohmura, 2012, The Review of scientific instruments.

Structural and chemical characteristics of atomically smooth GaN surfaces prepared by abrasive-free polishing with Pt catalyst

Kazuto Yamauchi, Kenta Arima, Keita Yagi, 2012 .

Trace element mapping of a single cell using a hard x-ray nanobeam focused by a Kirkpatrick-Baez mirror system

T. Ishikawa, Y. Nishino, K. Tamasaku, 2009 .

Fabrication of Ultraprecisely Figured Mirror for Nano Focusing Hard-x-ray

T. Ishikawa, Y. Nishino, K. Tamasaku, 2007 .

Enhancement of photoluminescence efficiency from GaN(0001) by surface treatments

Y. Sano, K. Yamauchi, A. Hattori, 2014 .

Development of scanning x-ray fluorescence microscope with spatial resolution of 30 nm using Kirkpatrick-Baez mirror optics

Hidekazu Mimura, Kazuto Yamauchi, Tetsuya Ishikawa, 2006 .

Catalyst-referred etching of silicon

Y. Sano, H. Mimura, K. Yamauchi, 2007 .

Computer numerically controlled plasma chemical vaporization machining with a pipe electrode for optical fabrication.

Y. Mori, K. Yamamura, Y. Sano, 1998, Applied optics.

Improvements in graphene growth on 4H-SiC(0001) using plasma induced surface oxidation

K. Yamamura, Y. Sano, K. Kawai, 2019, Journal of Applied Physics.

Aggregation of carbon atoms at SiO2/SiC(0 0 0 1) interface by plasma oxidation toward formation of pit-free graphene

Y. Sano, K. Kawai, K. Nishitani, 2014 .

X-ray adaptive zoom condenser utilizing an intermediate virtual focus.

T. Ishikawa, Y. Kohmura, M. Yabashi, 2021, Optics express.

Surface replication with one-nanometer.level smoothness by a nickel electroforming process

Y. Sano, H. Mimura, K. Yamauchi, 2011 .

Stitching-angle measurable microscopic-interferometer: Surface-figure metrology tool for hard X-ray nanofocusing mirrors with large curvature

Hidekazu Mimura, Takashi Kimura, Kazuto Yamauchi, 2010 .

Highly accurate differential deposition for X‐ray reflective optics

Hidekazu Mimura, Takashi Kimura, Kazuto Yamauchi, 2008 .

Thin crystal development and applications for hard x-ray free-electron lasers

Kazuto Yamauchi, Tetsuya Ishikawa, Satoshi Matsuyama, 2013, Optics & Photonics - Optical Engineering + Applications.

A Bragg beam splitter for hard x-ray free-electron lasers.

Kazuto Yamauchi, Tetsuya Ishikawa, Satoshi Matsuyama, 2013, Optics express.

Image quality improvement in a hard X-ray projection microscope using total reflection mirror optics.

Hidekazu Mimura, Yuzo Mori, Kazuto Yamauchi, 2004, Journal of synchrotron radiation.

At-wavelength figure metrology of total reflection mirrors in hard x-ray region

Hidekazu Mimura, Kazuto Yamauchi, Tetsuya Ishikawa, 2006, SPIE Optics + Photonics.

At-wavelength figure metrology of hard x-ray focusing mirrors

Hidekazu Mimura, Kazuto Yamauchi, Tetsuya Ishikawa, 2006 .

Creation of perfect surfaces

Hidekazu Mimura, Yuzo Mori, Kazuto Yamauchi, 2005 .

Ultraprecision machining based on physics and chemistry

Y. Mori, K. Yamamura, Y. Sano, 2003 .

Damage characteristics of platinum/carbon multilayers under x-ray free-electron laser irradiation

Kazuto Yamauchi, Tetsuya Ishikawa, Satoshi Matsuyama, 2013, Optics & Photonics - Optical Engineering + Applications.

Hard x-ray wavefront measurement and control for hard x-ray nanofocusing

Hidekazu Mimura, Takashi Kimura, Kazuto Yamauchi, 2007, SPIE Optical Engineering + Applications.

Reflective optics for sub-10nm hard x-ray focusing

K. Yamauchi, T. Ishikawa, M. Yabashi, 2007, SPIE Optical Engineering + Applications.

Fabrication of elliptically figured mirror for focusing hard x rays to size less than 50 nm

Hidekazu Mimura, Yuzo Mori, Kazuto Yamauchi, 2005 .

Efficient wet etching of GaN (0001) substrate with subsurface damage layer.

T. Okamoto, Y. Sano, K. Yamauchi, 2011, Journal of Nanoscience and Nanotechnology.

Planarization of SiC and GaN Wafers Using Polishing Technique Utilizing Catalyst Surface Reaction

Kazuto Yamauchi, Kenta Arima, Yasuhisa Sano, 2013 .

Surface Observation of 4H-SiC (0001) Planarized by Catalyst-Referred Etching

T. Okamoto, Y. Sano, K. Yamauchi, 2012 .

Abrasive-Free Planarization of 3-Inch 4H-SiC Substrate Using Catalyst-Referred Etching

T. Okamoto, Y. Sano, K. Yamauchi, 2011 .

TEM Observation of 8 Deg Off-Axis 4H-SiC (0001) Surfaces Planarized by Catalyst-Referred Etching

T. Okamoto, Y. Sano, K. Yamauchi, 2011 .

Damage-Free Planarization of 2-Inch 4H-SiC Wafer Using Pt Catalyst Plate and HF Solution

T. Okamoto, Y. Sano, H. Mimura, 2008 .

Planarization of 6-Inch 4H-SiC Wafer Using Catalyst-Referred Etching

Y. Sano, Tomohisa Kato, K. Yamauchi, 2014 .

Study of Terminated Species on 4H-SiC (0001) Surfaces Planarized by Catalyst-Referred Etching

T. Okamoto, Y. Sano, K. Yamauchi, 2013 .

Adsorption of hydrogen fluoride on SiC surfaces: A density functional theory study

Y. Sano, K. Yamauchi, K. Inagaki, 2012 .

First-Principles Study of Reaction Process of SiC and HF Molecules in Catalyst-Referred Etching

Y. Sano, K. Yamauchi, K. Inagaki, 2012 .

High-Resolution TEM Observation of 4H-SiC (0001) Surface Planarized by Catalyst-Referred Etching

Kazuto Yamauchi, Kenta Arima, Ryusuke Sagawa, 2012 .

Reduction of Surface Roughness of 4H-SiC by Catalyst-Referred Etching

T. Fuyuki, T. Okamoto, T. Hatayama, 2010 .

Termination dependence of surface stacking at 4 H -SiC ( 0001 ) − 1 × 1 : Density functional theory calculations

Y. Sano, K. Yamauchi, H. Hara, 2009 .

Planarization of 4H-SiC(0001) by catalyst-referred etching using pure water etchant

Y. Sano, K. Yamauchi, A. Isohashi, 2014, Proceedings of International Conference on Planarization/CMP Technology 2014.

Catalyst‐referred etching of 4HSiC substrate utilizing hydroxyl radicals generated from hydrogen peroxide molecules

T. Okamoto, Y. Sano, H. Mimura, 2008 .

Influence of the UV Light Intensity on the Photoelectrochemical Planarization Technique for Gallium Nitride

T. Okamoto, Y. Sano, K. Yamauchi, 2010 .

X-ray optics for advanced ultrafast pump–probe X-ray experiments at SACLA1

T. Togashi, M. Yabashi, Y. Sano, 2019, Journal of synchrotron radiation.

Removal characteristics of plasma chemical vaporization machining with a pipe electrode for optical fabrication.

Yuzo Mori, Yasuhisa Sano, Hideo Takino, 2010, Applied optics.

Performance of a hard X-ray split-and-delay optical system with a wavefront division

J. Hastings, Y. Inubushi, T. Togashi, 2018, Journal of synchrotron radiation.

Catalyst‐Assisted Electroless Flattening of Ge Surfaces in Dissolved‐O2‐Containing Water

T. Okamoto, Y. Sano, Yûsuke Saito, 2015 .

Electro‐spin resonance study of positive holes in J‐aggregates of a cyanine dye on AgBr microcrystals: Effect of aggregate size

Tadaaki Tani, Yasuhisa Sano, T. Tani, 1991 .

Atomically controlled surfacing of single crystalline SiC and GaN by catalyst-referred etching

Y. Sano, K. Yamauchi, A. Isohashi, 2014, Proceedings of International Conference on Planarization/CMP Technology 2014.

Novel Abrasive-free Planarization of Si and SiC using Catalyst

Y. Sano, H. Mimura, K. Yamauchi, 2007 .

4H-SiC Planarization Using Catalyst-Referred Etching with Pure Water

Y. Sano, K. Yamauchi, A. Isohashi, 2014 .

Dependence of process characteristics on atomic-step density in catalyst-referred etching of 4H-SiC(0001) surface.

Kazuto Yamauchi, Kenta Arima, Keita Yagi, 2011, Journal of nanoscience and nanotechnology.

Damage-Free Planarization of 4H-SiC (0001) by Catalyst-Referred Etching

Y. Sano, H. Mimura, K. Yamauchi, 2007 .

Defect-Free Planarization of 4H–SiC(0001) Substrate Using Reference Plate

T. Okamoto, Y. Sano, H. Mimura, 2008 .

Wave-optical analysis of submicron focus of hard x-ray beams by reflective optics

Hidekazu Mimura, Yuzo Mori, Akira Saito, 2002, SPIE Optics + Photonics.

Trace element mapping using a high‐resolution scanning X‐ray fluorescence microscope equipped with a Kirkpatrick‐Baez mirror system

Y. Nishino, K. Tamasaku, M. Yabashi, 2008 .

High-Speed Etching of Silicon Carbide Wafer Using High-Pressure SF6 Plasma

Y. Sano, K. Yamauchi, S. Matsuyama, 2021 .

Polishing Technique of Next-Generation Power Semiconductor SiC Substrate

Y. Sano, 2018 .

Erratum: Breaking the 10 nm barrier in hard-X-ray focusing

Hidekazu Mimura, Takashi Kimura, Kazuto Yamauchi, 2010 .

Chemical planarization of GaN using hydroxyl radicals generated on a catalyst plate in H2O2 solution

T. Okamoto, Y. Sano, H. Mimura, 2008 .

Hard x-ray intensity autocorrelation using direct two-photon absorption

Y. Inubushi, K. Tamasaku, K. Tono, 2022, Physical Review Research.

Development of a Mirror Manipulator for Hard X-ray Microscopy with High Resolution

T. Ishikawa, Y. Nishino, K. Tamasaku, 2006 .

Change in Surface Morphology of Si (100) Wafer after Oxidation with Atmospheric-Pressure Plasma

Y. Sano, K. Yamauchi, S. Matsuyama, 2016 .

New Polishing Technique of Semiconductor SiC Substrate : Development of Polishing Technique Utilizing Catalyst Surface Reaction

Y. Sano, K. Yamauchi, K. Yagi, 2012 .

Development of concave-convex imaging mirror system for a compact and achromatic full-field x-ray microscope

Kazuto Yamauchi, Jumpei Yamada, Yoshiki Kohmura, 2017, Optical Engineering + Applications.

Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror.

Hidekazu Mimura, Yuzo Mori, Kazuto Yamauchi, 2002, Journal of synchrotron radiation.