Karen L. Turnquest

Experimental determination of the impact of polysilicon LER on sub-100-nm transistor performance

John L. Sturtevant, Nigel Cave, Kyle Patterson, 2001, SPIE Advanced Lithography.

Using laser surface scanning and bare wafer review to diagnose photolithography track developer process-induced defect issues

Karen L. Turnquest, Linda M. Bond, Christine Fischer, 1999, Advanced Lithography.

Use of multiple lithography monitors in a defect control strategy for high volume manufacturing

Karen L. Turnquest, Dan Sutton, L. Bond, 1999, 10th Annual IEEE/SEMI. Advanced Semiconductor Manufacturing Conference and Workshop. ASMC 99 Proceedings (Cat. No.99CH36295).

Use of exposure compensation to improve device performance for speed and binning based on electrical parametric feedback into fabrication design

Doug Downey, Paul W. Ackmann, Stuart E. Brown, 1997, Advanced Lithography.

Measurements of the Reaction-Diffusion Front of Model Chemically Amplified Photoresists with Varying Photoacid Size |

Wen-li Wu, Vivek M. Prabhu, Bryan D. Vogt, 2006 .

Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists

Wen-li Wu, Vivek M. Prabhu, Bryan D. Vogt, 2006 .

Responding to the Challenge: Materials Design for Immersion Lithography

Andrew R. Romano, Karen L. Turnquest, Georgia K. Rich, 2006 .