M. Shaw

发表

Fabrication of ultra-dense sub-10 nm in-plane Si nanowire arrays by using a novel block copolymer method: optical properties.

M. Morris, J. Holmes, Tandra Ghoshal, 2016, Nanoscale.

Nitrogen reactive ion etch processes for the selective removal of poly-(4-vinylpyridine) in block copolymer films

P. Swift, G. Hughes, R. O'Connor, 2018, Nanotechnology.

Fabrication of MoS2 Nanowire Arrays and Layered Structures via the Self‐Assembly of Block Copolymers

Atul S. Chaudhari, M. Morris, J. Holmes, 2016 .

Achieving structural control with thin polystyrene- b-polydimethylsiloxane block copolymer films: The complex relationship of interface chemistry, annealing methodology and process conditions

M. Morris, N. Petkov, M. Shaw, 2013 .

Block copolymer lithography: Feature size control and extension by an over-etch technique

M. Morris, J. Holmes, M. Shaw, 2012 .

Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry.

M. Morris, J. Holmes, M. Shaw, 2013, ACS applied materials & interfaces.

Soft Graphoepitaxy of Hexagonal PS-b-PDMS on Nanopatterned POSS Surfaces fabricated by Nanoimprint Lithography

M. Morris, M. Shaw, M. Zelsmann, 2012 .

Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing

M. Morris, J. Holmes, Tandra Ghoshal, 2016, Nano Research.

Directed self-assembly of PS-b-PMMA block copolymer using HSQ lines for translational alignment

Michael Schmidt, M. Morris, N. Petkov, 2013 .

Synthesis and characterization of highly ordered cobalt-magnetite nanocable arrays.

D. Arnold, M. Morris, J. Holmes, 2006, Small.

Surface-directed dewetting of a block copolymer for fabricating highly uniform nanostructured microdroplets and concentric nanorings.

M. Morris, J. Holmes, M. Shaw, 2011, ACS nano.

Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems.

Mustafa Ozmen, Justin D Holmes, Dipu Borah, 2013, Langmuir : the ACS journal of surfaces and colloids.

Plasma etch technologies for the development of ultra-small feature size transistor devices

Justin D. Holmes, Richard A. Farrell, Michael A. Morris, 2011 .

Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design

M. Shaw, M. Zelsmann, D. Borah, 2013 .

A vertical lamellae arrangement of sub-16 nm pitch (domain spacing) in a microphase separated PS-b-PEO thin film by salt addition

Justin D. Holmes, Tandra Ghoshal, Apostolos Avgeropoulos, 2015 .

Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process

Justin D. Holmes, Tandra Ghoshal, Atul Chaudhari, 2014, Advanced Lithography.

Fabrication of Ordered, Large Scale, Horizontally‐Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach

M. Morris, J. Holmes, M. Shaw, 2014, Advanced materials.

The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions.

M. Morris, J. Holmes, M. Shaw, 2013, Journal of colloid and interface science.

Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing.

M. Morris, J. Holmes, M. Shaw, 2016, Soft matter.

Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application

P. Carolan, M. Morris, Saibal Roy, 2013, Scientific Reports.

Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process.

M. Morris, J. Holmes, M. Shaw, 2013, ACS applied materials & interfaces.

Large-scale parallel arrays of silicon nanowires via block copolymer directed self-assembly.

Nikolay Petkov, Vladimir Djara, Tarek Lutz, 2012, Nanoscale.

Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography

Tarek Lutz, Justin D Holmes, Dipu Borah, 2013, Nanotechnology.

Fabrication of Graphoepitaxial Gate-All-Around Si Circuitry Patterned Nanowire Arrays Using Block Copolymer Assisted Hard Mask Approach

M. Morris, M. Shaw, R. Lundy, 2021, ACS nano.

A general method for controlled nanopatterning of oxide dots: a microphase separated block copolymer platform

Justin D. Holmes, Tandra Ghoshal, Michael A. Morris, 2012 .

Ordered Mesoporous Silicate Structures as Potential Templates for Nanowire Growth

D. Arnold, J. Holmes, H. Amenitsch, 2007 .

Study on the combined effects of solvent evaporation and polymer flow upon block copolymer self-assembly and alignment on topographic patterns.

J. Gleeson, M. Morris, N. Petkov, 2009, Langmuir : the ACS journal of surfaces and colloids.

The Morphology of Ordered Block Copolymer Patterns as Probed by High Resolution Imaging

Justin D. Holmes, Nikolay Petkov, Tandra Ghoshal, 2014 .

Area Selective Polymer Brush Deposition.

M. Morris, M. Shaw, C. Cummins, 2017, Macromolecular rapid communications.

Reduction and control of domain spacing by additive inclusion: morphology and orientation effects of glycols on microphase separated PS-b-PEO.

M. Morris, J. Holmes, M. Shaw, 2015, Journal of colloid and interface science.

Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process.

M. Morris, J. Holmes, M. Shaw, 2013, ACS applied materials & interfaces.

"In situ" hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays.

M. Morris, J. Holmes, M. Shaw, 2012, Nanoscale.

Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems.

M. Morris, J. Holmes, M. Shaw, 2013, Langmuir : the ACS journal of surfaces and colloids.