Youngseo An

发表

Structural and Electrical Properties of EOT HfO2 (<1 nm) Grown on InAs by Atomic Layer Deposition and Its Thermal Stability.

Hyoungsub Kim, Y. Kang, H. Kang, 2016, ACS applied materials & interfaces.

Al2O3 Passivation Effect in HfO2·Al2O3 Laminate Structures Grown on InP Substrates.

Hyoungsub Kim, Y. Kang, H. Kang, 2017, ACS applied materials & interfaces.

Comparative study of atomic-layer-deposited stacked (HfO2/Al2O3) and nanolaminated (HfAlOx) dielectrics on In0.53Ga0.47As.

C. Mahata, Hyoungsub Kim, Youngseo An, 2013, ACS applied materials & interfaces.

Electrical properties of the HfO2/Al2O3 dielectrics stacked using single- and dual-temperature atomic-layer deposition processes on In0.53Ga0.47As

Hyoungsub Kim, Youngseo An, Sungho Choi, 2019, Semiconductor Science and Technology.

Electrical properties of HfO2/Al2O3 dielectrics fabricated on In0.53Ga0.47As by using atomic layer deposition at low temperatures (100 - 200 ◦C)

Hyoungsub Kim, Youngseo An, Sungho Choi, 2018 .

Tailoring the interface quality between HfO2 and GaAs via in situ ZnO passivation using atomic layer deposition.

P. McIntyre, Hyoungsub Kim, Youngseo An, 2014, ACS applied materials & interfaces.

Trap-assisted high responsivity of a phototransistor using bi-layer MoSe2 grown by molecular beam epitaxy

Hyoungsub Kim, K. Jeong, Youngseo An, 2019, Applied Surface Science.

Resistive switching and synaptic behaviors of an HfO2/Al2O3 stack on ITO for neuromorphic systems

Byung-Gook Park, C. Mahata, Hyoungsub Kim, 2020, Journal of Alloys and Compounds.

Comparative study of trimethylaluminum and tetrakis(dimethylamido)titanium pretreatments on Pd/Al2O3/p-GaSb capacitors

Hyoungsub Kim, Youngseo An, M. Cho, 2017 .

Effects of H2 High-pressure Annealing on HfO2/Al2O3/In0.53Ga0.47As Capacitors: Chemical Composition and Electrical Characteristics

P. McIntyre, Hyoungsub Kim, M. Nguyen, 2017, Scientific Reports.

Rapid fabrication of Al2O3 encapsulations for organic electronic devices

K. Choi, Youngseo An, Junaid Ali, 2015 .

Highly Flexible and Transparent Ag Nanowire Electrode Encapsulated with Ultra-Thin Al2O3: Thermal, Ambient, and Mechanical Stabilities

Hyoungsub Kim, Eunha Lee, Youngseo An, 2017, Scientific Reports.

Electrical properties and thermal stability in stack structure of HfO2/Al2O3/InSb by atomic layer deposition

Hyoungsub Kim, Y. Kang, K. Jeong, 2017, Scientific Reports.

Electrical and band structural analyses of Ti1−xAlxOy films grown by atomic layer deposition on p-type GaAs

C. Mahata, Hyoungsub Kim, Y. Kang, 2015 .

Comparative study of atomic-layer-deposited stacked (HfO2/Al2O3) and nanolaminated (HfAlOx) dielectrics on In0.53Ga0.47As.

C. Mahata, Hyoungsub Kim, Youngseo An, 2013, ACS applied materials & interfaces.