Jim DeWitt

Method to produce a reference grid artifact for matching a MEBES 4500 system to an external reference

Jim DeWitt, Joe Watson, Thomas P. Coleman, 1995, Photomask Technology.

Ever-increasing role of mask technology in deep submicron lithography

Giang T. Dao, Jim DeWitt, Rosanne LaVoy, 1994, Photomask and Next Generation Lithography Mask Technology.

Investigation of MEBES 4500 system composite performance

Jim DeWitt, Leonard Gasiorek, Charles A. Sauer, 1995, Photomask Technology.

Postioning accuracy issues for 0.35 micron critical dimension microlithography

An Tran, Jim DeWitt, Charlie Boettcher, 1994, Photomask Technology.

MEBES 4000 optimization and characterization of MEBES 4500

Frank E. Abboud, Jim DeWitt, Leonard Gasiorek, 1994, Photomask Technology.

Investigation of multiphase printing writing modes on mask performance in MEBES 4500

Jim DeWitt, Mahesh Chandramouli, J. Millino, 1996, Photomask Technology.