C.H.M. van der Werf

发表

Thin film micro- and polycrystalline silicon nip cells on stainless steel made by hot-wire chemical vapour deposition

R. Schropp, J. Rath, H. Li, 2006 .

Ultrafast deposition of silicon nitride and semiconductor silicon thin films by hot wire chemical vapor deposition

R. Schropp, J. Rath, H. Li, 2009 .

Nanostructured thin films for multiband-gap silicon triple junction solar cells

R. Schropp, J. Rath, H. Li, 2008 .

Tandem solar cells deposited using hot-wire chemical vapor deposition

R. Schropp, C.H.M. van der Werf, M. K. V. Veen, 2003 .

Improved Efficiency of Single Junction Microcrystalline Silicon n-i-p Solar Cells with an i-Layer Made by Hot-Wire CVD

R. Schropp, J. Rath, H. Li, 2007 .

Heat transfer model of an iCVD reactor

R. Schropp, J. Rath, C.H.M. van der Werf, 2009 .

Unambiguous determination of Fourier-transform infrared spectroscopy proportionality factors: The case of silicon nitride

R. Schropp, C.H.M. van der Werf, V. Verlaan, 2006 .

Optoelectronic properties of hot-wire silicon layers deposited at 100 °C

R. Schropp, J. Rath, C.H.M. van der Werf, 2008 .

Protocrystalline Silicon at High Rate from Undiluted Silane

R. Schropp, C.H.M. van der Werf, M. K. V. Veen, 2004 .

On the development of single and multijunction solar cells with hot-wire CVD deposited active layers

R. Schropp, J. Rath, H. Li, 2008 .

Improvement of the efficiency of triple junction n–i–p solar cells with hot-wire CVD proto- and microcrystalline silicon absorber layers

R. Schropp, J. Rath, H. Li, 2008 .

Novel amorphous silicon solar cell using a manufacturing procedure with a temporary superstrate

Miro Zeman, M.C.M. van de Sanden, C.H.M. van der Werf, 1999 .

Beneficial effects of sputtered ZnO:Al protection layer on SnO2:F for high-deposition rate hot-wire CVD p i n solar cells

R. Schropp, J. Rath, C.H.M. van der Werf, 2006 .

All hot wire CVD TFTs with high deposition rate silicon nitride (3 nm/s)

R. Schropp, C.H.M. van der Werf, V. Verlaan, 2008 .

Understanding light trapping by light scattering textured back electrodes in thin film n‐i‐p-type silicon solar cells

R. Schropp, J. Rath, H. Li, 2007 .

Space-charge-limited currents in n-i-n devices incorporating glow-discharge and hot-wire deposited a-Si:H

K. Feenstra, R. Schropp, C.H.M. van der Werf, 1997 .

Optimization of hydrogenated amorphous silicon germanium thin films and solar cells deposited by hot wire chemical vapor deposition

R. Schropp, S. Yun, C.H.M. van der Werf, 2015 .

High-density silicon nitride deposited at low substrate temperature with high deposition rate using hot wire chemical vapour deposition

R. Schropp, J. Rath, Y. Mai, 2007 .

Controlling the quality of nanocrystalline silicon made by hot-wire chemical vapor deposition by using a reverse H2 profiling technique

R. Schropp, J. Rath, H. Li, 2008 .

Hot-wire chemical vapor-deposited microcrystalline silicon in single and tandem n–i–p solar cells

R. Schropp, J. Rath, H. Li, 2006 .

Optimization of n–i–p protocrystalline SiGe:H thin film solar cells for application in thin film multijunction solar cells

R. Schropp, J. Rath, H. Li, 2006 .

All hot wire chemical vapor deposition low substrate temperature transparent thin film moisture barrier

R. Schropp, J. Rath, C.H.M. van der Werf, 2013 .

Synthesis of poly(meta-diethynyl benzene) with initiated chemical vapour deposition

R. Schropp, J. Rath, C.H.M. van der Werf, 2011 .

The effect of composition on the bond structure and refractive index of silicon nitride deposited by HWCVD and PECVD

H. Dekkers, M. Zeman, R. Schropp, 2009 .

Incorporation of amorphous and microcrystalline silicon in n–i–p solar cells

R. Schropp, J. Rath, C.H.M. van der Werf, 2003 .

Hydrogenated amorphous silicon germanium by Hot Wire CVD as an alternative for microcrystalline silicon in tandem and triple junction solar cells

R. Schropp, S. Yun, C.H.M. van der Werf, 2014 .

Effects of Electrode Spacing and Hydrogen Dilution on a-SiC:H and a-Si:H Layers

F. Demichelis, W. F. V. D. Weg, R. Schropp, 1993 .

Bonding rearrangement in amorphous silicon nitrides deposited by hot-wire chemical vapor deposition upon thermal annealing

R. Schropp, J. Rath, Y. Mai, 2008 .

Thin Film a-Si/poly-Si Multibandgap Tandem Solar Cells With Both Absorber Layers Deposited by Hot Wire Cvd

R. Schropp, J. Rath, C.H.M. van der Werf, 2001 .

Low Temperature Poly-Si Layers Deposited by Hot Wire CVD Yielding a Mobility of 4.0 cm 2 V −1 s −1 in Top Gate Thin Film Transistors

S. Wagner, R. Schropp, B. Stannowski, 2000 .

Response to simulated typical daily outdoor irradiation conditions of thin-film silicon-based triple-band-gap, triple-junction solar cells

W. V. Sark, R. Schropp, C.H.M. van der Werf, 2009 .

Initiated chemical vapour deposition (iCVD) of thermally stable poly-glycidyl methacrylate

R. Schropp, J. Rath, K. Gleason, 2007 .

Improvement of μc-Si:H n–i–p cell efficiency with an i-layer made by hot-wire CVD by reverse H2-profiling

R. Schropp, J. Rath, H. Li, 2008 .

Improving the performance of amorphous and crystalline silicon heterojunction solar cells by monitoring surface passivation

W. V. Sark, R. Schropp, J. Rath, 2012 .

Polymer layers by initiated chemical vapor deposition for thin film gas barrier encapsulation

R. Schropp, J. Rath, C.H.M. van der Werf, 2011 .

Deposition of device quality amorphous silicon by hot-wire CVD

K. Feenstra, R. Schropp, C.H.M. van der Werf, 1997 .

Deposition of HWCVD poly-Si films at a high growth rate

R. Schropp, J. Rath, C.H.M. van der Werf, 2003 .

Shutterless deposition of phosphorous doped microcrystalline silicon by Cat-CVD

J. Andreu, R. Schropp, C.H.M. van der Werf, 2003 .

a-Si:H/poly-Si tandem cells deposited by hot-wire CVD

R. Schropp, J. Rath, C.H.M. van der Werf, 2002 .

Hot Wire CVD for thin film triple junction cells and for ultrafast deposition of the SiN passivation layer on polycrystalline Si solar cells

R. Schropp, J. Rath, H. Li, 2008 .

Comparison of surface passivation of crystalline silicon by a-Si:H with and without atomic hydrogen treatment using hot-wire chemical vapor deposition

W. V. Sark, R. Schropp, J. Rath, 2011 .

Effect of ammonia on Ta filaments in the hot wire CVD process

R. Schropp, C.H.M. van der Werf, V. Verlaan, 2009 .

Silicon nitride at high deposition rate by Hot Wire Chemical Vapor Deposition as passivating and antireflection layer on multicrystalline silicon solar cells

R. Schropp, B. Stannowski, J. Rath, 2006 .

The influence of the filament temperature on the structure of hot-wire deposited silicon

R. Schropp, J. Rath, C.H.M. van der Werf, 2003 .

Investigation of scaling-up issues in hot-wire CVD of polycrystalline silicon

R. Schropp, J. Rath, C.H.M. van der Werf, 2003 .

Deposition of device quality silicon nitride with ultra high deposition rate (> 7 nm/s) using hot-wire CVD

R. Schropp, C.H.M. van der Werf, V. Verlaan, 2008 .

Performance of heterojunction p+ microcrystalline silicon n crystalline silicon solar cells

W. F. V. D. Weg, R. Schropp, J. Rath, 1997 .